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Category:G03F7/00
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Pages in category "G03F7/00"
The following 159 pages are in this category, out of 159 total.
1
- 17386312. DEVICES, SYSTEMS, AND METHODS FOR THE TRANSFORMATION AND CROPPING OF DROP PATTERNS simplified abstract (CANON KABUSHIKI KAISHA)
- 17525511. METHOD FOR IMPROVING ACCURACY OF IMPRINT FORCE APPLICATION IN IMPRINT LITHOGRAPHY simplified abstract (CANON KABUSHIKI KAISHA)
- 17525729. LAYER FORMING SYSTEM INCLUDING COVER WITH SUPPORT PADS, A POSITIONING SYSTEM WITH THE COVER AND SUPPORT PADS, AND A METHOD OF LOADING A PLATE simplified abstract (CANON KABUSHIKI KAISHA)
- 17816078. SYSTEM AND METHOD FOR GENERATING CONTROL VALUES FOR OVERLAY CONTROL OF AN IMPRINT TOOL simplified abstract (CANON KABUSHIKI KAISHA)
- 17932016. RESIDUAL LAYER THICKNESS MODULATION IN NANOIMPRINT LITHOGRAPHY simplified abstract (Google LLC)
- 18049128. PLANARIZATION PROCESS, APPARATUS AND METHOD OF MANUFACTURING AN ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18107427. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18130001. SUPERCRITICAL FLUID SUPPLY APPARATUS, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18131436. OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AND METHOD OF MANUFACTURING MASK BY USING THE OPTICAL PROXIMITY CORRECTION METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18166924. Adaptive Feedforward and Feedback Control for Controlled Viscosity Alignment and Field-to-Field Related Friction Variation simplified abstract (CANON KABUSHIKI KAISHA)
- 18210548. MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18230472. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18239301. PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, AND COLOR FILTER simplified abstract (SAMSUNG SDI CO., LTD.)
- 18244376. METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18302375. CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18318801. IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18326659. PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18329647. FILM FORMING METHOD, FILM FORMING APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18338789. EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18350611. LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE FABRICATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18351637. IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18354078. IMPRINTING METHOD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18360209. METHOD AND COMPUTING DEVICE FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18360238. EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18361728. LITHOGRAPHY SYSTEM AND METHOD THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18363957. FILM FORMING APPARATUS, FILM FORMING METHOD, MANUFACTURING METHOD OF ARTICLE, AND STORAGE MEDIUM simplified abstract (CANON KABUSHIKI KAISHA)
- 18364850. STAGE APPARATUS, PATTERN FORMING APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18368995. EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18401729. SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTOR MANUFACTURING simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18446400. LITHOGRAPHY SYSTEM AND METHODS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18448110. METHOD OF USING WAFER STAGE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18449779. DETECTION DEVICE, DETECTION METHOD, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18450457. DETERMINING APPARATUS, PATTERN FORMING APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18454957. INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, STORAGE MEDIUM, EXPOSURE APPARATUS, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18455976. CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18457983. PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND IMPRINT APPARATUS simplified abstract (Kioxia Corporation)
- 18458056. PATTERN FORMING METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE simplified abstract (Kioxia Corporation)
- 18465420. SUBSTRATE TREATMENT APPARATUS AND TREATMENT SOLUTION SUPPLY METHOD simplified abstract (TOKYO ELECTRON LIMITED)
- 18471005. METHOD FOR INTEGRATION OF OPTICAL DEVICE FABRICATION WITH SUBSTRATE THICKNESS ENGINEERING simplified abstract (Applied Materials, Inc.)
- 18480148. OVERLAY MARK, MANUFACTURING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18481030. DETERMINATION METHOD, DETERMINATION APPARATUS, INFORMATION PROCESSING METHOD, STORAGE MEDIUM, INFORMATION PROCESSING APPARATUS, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18481897. Magnification Ramp Scheme to Mitigate Template Slippage simplified abstract (CANON KABUSHIKI KAISHA)
- 18489062. EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18492587. INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18496160. PHOTO-CURABLE COMPOSITION AND METHODS FOR PREPARING CURED FILM, OPTICAL COMPONENT, CIRCUIT SUBSTRATE, ELECTRICAL COMPONENT AND REPLICA MOLD USING THE SAME simplified abstract (CANON KABUSHIKI KAISHA)
- 18504007. WAFER CHUCK, METHOD FOR PRODUCING THE SAME, AND EXPOSURE APPARATUS simplified abstract (CANON KABUSHIKI KAISHA)
- 18504147. METHOD AND APPARATUS FOR DIFFRACTION-BASED OVERLAY MEASUREMENT simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18508195. TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18513893. PARTICLE REMOVAL METHOD simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18514254. MULTI-METAL FILL WITH SELF-ALIGNED PATTERNING AND DIELECTRIC WITH VOIDS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18517070. LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18517635. TECHNIQUES FOR CORRECTION OF ABERRATIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18517653. FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18521853. IMPRINT COMPOSITIONS WITH PASSIVATED NANOPARTICLES AND MATERIALS AND PROCESSES FOR MAKING THE SAME simplified abstract (Applied Materials, Inc.)
- 18523620. DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING simplified abstract (Applied Materials, Inc.)
- 18526350. SUBSTRATE PROCESSING APPARATUS simplified abstract (TOKYO ELECTRON LIMITED)
- 18541174. DISPLAY SUBSTRATE, DISPLAY PANEL, DISPLAY DEVICE, METHOD OF DETECTING POST SPACER, AND METHOD OF MANUFACTURING POST SPACER simplified abstract (BOE TECHNOLOGY GROUP CO., LTD.)
2
- 20240012341. ELECTROSTATIC CLAMP simplified abstract (ASML Netherlands B.V.)
- 20240019780. PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM AND MICROLENS ARRAY simplified abstract (Advanced Echem Materials Company Limited)
- 20240027897. LAMINATE AND MANUFACTURING METHOD OF LAMINATE simplified abstract (FUJIFILM Corporation)
- 20240027919. MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS simplified abstract (KLA Corporation)
- 20240036386. DISPLAY PANEL, DISPLAY APPARATUS, METHOD OF FABRICATING DISPLAY PANEL, AND COUNTER SUBSTRATE simplified abstract (BOE Technology Group Co., Ltd.)
- 20240036465. Magnification Ramp Scheme to Mitigate Template Slippage simplified abstract (CANON KABUSHIKI KAISHA)
- 20240036470. Method for Forming an Interconnect Structure simplified abstract (IMEC VZW)
- 20240036480. A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAST ONE PATTERNING DEVICE, LITHOGRAPHIC METHOD AND METROLOGY METHOD simplified abstract (ASML NETHERLANDS B.V.)
- 20240045340. METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPARATUSES simplified abstract (ASML Netherlands B.V.)
- 20240046022. METHODS FOR SAMPLE SCHEME GENERATION AND OPTIMIZATION simplified abstract (ASML Netherlands B.V.)
- 20240053686. EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 20240085777.PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (samsung electronics co., ltd.)
- 20240085812.SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD simplified abstract (samsung electronics co., ltd.)
B
- Blockchain patent applications on April 11th, 2024
- Blockchain patent applications on April 18th, 2024
- Blockchain patent applications on April 25th, 2024
- Blockchain patent applications on February 15th, 2024
- Blockchain patent applications on February 1st, 2024
- Blockchain patent applications on February 22nd, 2024
- Blockchain patent applications on February 8th, 2024
- Blockchain patent applications on January 11th, 2024
- Blockchain patent applications on January 18th, 2024
- Blockchain patent applications on January 25th, 2024
- Blockchain patent applications on March 14th, 2024
- Blockchain patent applications on March 28th, 2024
C
- Canon kabushiki kaisha (20240091825). CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE simplified abstract
- Canon kabushiki kaisha (20240118626). DETERMINATION METHOD, DETERMINATION APPARATUS, INFORMATION PROCESSING METHOD, STORAGE MEDIUM, INFORMATION PROCESSING APPARATUS, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE simplified abstract
- Canon kabushiki kaisha (20240126165). IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD simplified abstract
- Canon kabushiki kaisha (20240126182). EXPOSURE APPARATUS, CONTROL METHOD OF EXPOSURE APPARATUS, INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract
- Canon kabushiki kaisha (20240134270). PLANARIZATION PROCESS, APPARATUS AND METHOD OF MANUFACTURING AN ARTICLE simplified abstract
- Canon kabushiki kaisha (20240134286). EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract
- CANON KABUSHIKI KAISHA patent applications on April 11th, 2024
- CANON KABUSHIKI KAISHA patent applications on April 18th, 2024
- CANON KABUSHIKI KAISHA patent applications on April 25th, 2024
- CANON KABUSHIKI KAISHA patent applications on February 15th, 2024
- CANON KABUSHIKI KAISHA patent applications on February 1st, 2024
- CANON KABUSHIKI KAISHA patent applications on February 29th, 2024
- CANON KABUSHIKI KAISHA patent applications on February 8th, 2024
- CANON KABUSHIKI KAISHA patent applications on January 18th, 2024
- CANON KABUSHIKI KAISHA patent applications on January 25th, 2024
- CANON KABUSHIKI KAISHA patent applications on March 14th, 2024
- CANON KABUSHIKI KAISHA patent applications on March 21st, 2024
G
K
- Kioxia corporation (20240094624). PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND IMPRINT APPARATUS simplified abstract
- Kioxia corporation (20240096644). PATTERN FORMING METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE simplified abstract
- Kioxia Corporation patent applications on March 21st, 2024
M
S
- SAMSUNG DISPLAY CO., LTD. patent applications on February 8th, 2024
- Samsung electronics co., ltd. (20240094646). EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS simplified abstract
- Samsung electronics co., ltd. (20240120199). METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240120287). OVERLAY MARK, MANUFACTURING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240121877). EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE simplified abstract
- Samsung electronics co., ltd. (20240134290). MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract
- SAMSUNG ELECTRONICS CO., LTD. patent applications on April 11th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on April 25th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 1st, 2024
- Samsung Electronics Co., Ltd. patent applications on February 29th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 8th, 2024
- Samsung Electronics Co., Ltd. patent applications on January 18th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 14th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 21st, 2024
T
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on January 25th, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240103378). EUV Lithography System With 3D Sensing and Tunning Modules simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240134293). SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTOR MANUFACTURING simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on April 25th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on February 29th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on January 18th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 14th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on March 28th, 2024
U
- US Patent Application 18227231. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18228224. PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY simplified abstract
- US Patent Application 18230062. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18230367. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES simplified abstract
- US Patent Application 18231017. EUV LIGHT SOURCE AND APPARATUS FOR LITHOGRAPHY simplified abstract
- US Patent Application 18231070. OPTIMIZED MASK STITCHING simplified abstract
- US Patent Application 18231170. DEVICE AND METHOD TO REMOVE DEBRIS FROM AN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY SYSTEM simplified abstract
- US Patent Application 18231173. EUV WAFER DEFECT IMPROVEMENT AND METHOD OF COLLECTING NONCONDUCTIVE PARTICLES simplified abstract
- US Patent Application 18231416. METHOD AND APPARATUS FOR REMOVING CONTAMINATION simplified abstract
- US Patent Application 18232264. PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18232745. ENHANCING LITHOGRAPHY OPERATION FOR MANUFACTURING SEMICONDUCTOR DEVICES simplified abstract
- US Patent Application 18232758. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES simplified abstract
- US Patent Application 18359447. MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS simplified abstract
- US Patent Application 18359648. Optical Mode Optimization for Wafer Inspection simplified abstract
- US Patent Application 18360030. PELLICLE DESIGN FOR MASK APPLICATION simplified abstract
- US Patent Application 18360092. COMPOSITION FOR FORMING IMPRINT PATTERN, CURED SUBSTANCE, IMPRINT PATTERN PRODUCING METHOD, DEVICE, AND METHOD FOR MANUFACTURING DEVICE simplified abstract
- US Patent Application 18361254. SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES simplified abstract
- US Patent Application 18361879. OPTICAL PROXIMITY CORRECTION AND PHOTOMASKS simplified abstract
- US Patent Application 18362135. SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION simplified abstract
- US Patent Application 18362889. IC DEVICE LAYOUT METHOD simplified abstract
- US Patent Application 18362954. METHOD OF MAKING BIOCHIP HAVING A CHANNEL simplified abstract
- US Patent Application 18366092. EUV PHOTOLITHOGRAPHY SYSTEM FUEL SOURCE AND METHODS OF OPERATING THE SAME simplified abstract
- US Patent Application 18446597. IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract
- US Patent Application 18446834. POLYIMIDE PROFILE CONTROL simplified abstract
- US Patent Application 18446870. SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION simplified abstract
- US Patent Application 18447104. APPARATUS, SYSTEM AND METHOD simplified abstract
- US Patent Application 18447361. MODULE VESSEL WITH SCRUBBER GUTTERS SIZED TO PREVENT OVERFLOW simplified abstract
- US Patent Application 18447389. SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURE simplified abstract
- US Patent Application 18447869. SYSTEM AND METHOD FOR MULTIPLE STEP DIRECTIONAL PATTERNING simplified abstract