US Patent Application 18447104. APPARATUS, SYSTEM AND METHOD simplified abstract

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APPARATUS, SYSTEM AND METHOD

Organization Name

Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor(s)

Po-Han Wang of Hsinchu (TW)

Yu-Hsiang Hu of Hsinchu (TW)

Hung-Jui Kuo of Hsinchu (TW)

Chen-Hua Yu of Hsinchu (TW)

APPARATUS, SYSTEM AND METHOD - A simplified explanation of the abstract

This abstract first appeared for US patent application 18447104 titled 'APPARATUS, SYSTEM AND METHOD

Simplified Explanation

The patent application describes an apparatus and method for effectively removing evaporated material.

  • The apparatus includes a hot plate and an exhaust hood assembly suspended over the hot plate.
  • The exhaust hood assembly consists of a trench plate, a cover plate, and a single exhaust pipe header.
  • The exhaust hood assembly reduces condensation and collects any remaining condensation to prevent it from affecting further manufacturing steps.


Original Abstract Submitted

An apparatus and a method for effectively exhausting evaporated material are provided. In an embodiment the apparatus includes a hot plate and an exhaust hood assembly suspended over the hot plate. The exhaust hood assembly includes a trench plate, a cover plate over the trench plate and a single exhaust pipe header over and attached to a single exhaust opening of the cover plate. During operation, the exhaust hood assembly reduces the amount of condensation and also collects any remaining condensation in order to help prevent condensation from impacting further manufacturing steps.