17816078. SYSTEM AND METHOD FOR GENERATING CONTROL VALUES FOR OVERLAY CONTROL OF AN IMPRINT TOOL simplified abstract (CANON KABUSHIKI KAISHA)

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SYSTEM AND METHOD FOR GENERATING CONTROL VALUES FOR OVERLAY CONTROL OF AN IMPRINT TOOL

Organization Name

CANON KABUSHIKI KAISHA

Inventor(s)

Nilabh K. Roy of Austin TX (US)

Mario Johannes Meissl of Austin TX (US)

Anshuman Cherala of Austin TX (US)

SYSTEM AND METHOD FOR GENERATING CONTROL VALUES FOR OVERLAY CONTROL OF AN IMPRINT TOOL - A simplified explanation of the abstract

This abstract first appeared for US patent application 17816078 titled 'SYSTEM AND METHOD FOR GENERATING CONTROL VALUES FOR OVERLAY CONTROL OF AN IMPRINT TOOL

Simplified Explanation

The patent application describes a method for optimizing the control values of an imprint apparatus to minimize overlay errors while maintaining operating constraints. The method involves obtaining a set of relationship values that indicate the relationships between control values and overlay corrections. Based on these relationship values, a set of control values is estimated using constrained optimization techniques. The set of control values includes in-plane control values and out-of-plane control values. The in-plane control values are in a plane parallel to the template-substrate interface, while the out-of-plane control values are out of the plane.

  • The patent application proposes a method for optimizing control values in an imprint apparatus to minimize overlay errors.
  • The method uses a set of relationship values to estimate a set of control values that globally minimizes residual overlay errors.
  • The set of control values includes in-plane and out-of-plane control values.
  • The in-plane control values are in a plane parallel to the template-substrate interface.
  • The method ensures that the set of control values remains within a set of operating constraints.

Potential applications of this technology:

  • Semiconductor manufacturing: The method can be applied in the fabrication of semiconductor devices to improve the accuracy and precision of imprint lithography processes.
  • Nanofabrication: The technology can be used in the production of nanoscale structures and devices, enabling more precise control over the imprinting process.
  • Optics and photonics: The method can be utilized in the manufacturing of optical components and devices, enhancing the alignment and registration accuracy.

Problems solved by this technology:

  • Overlay errors: The method addresses the challenge of minimizing overlay errors, which can negatively impact the quality and performance of fabricated devices.
  • Control value optimization: The technology provides a systematic approach to optimize the control values of an imprint apparatus, ensuring accurate and reliable imprinting processes.
  • Operating constraints: The method ensures that the estimated control values remain within specified operating constraints, preventing any potential damage or instability during the imprinting process.

Benefits of this technology:

  • Improved accuracy: By minimizing overlay errors, the technology enhances the accuracy and precision of imprint lithography processes, leading to higher quality and more reliable fabricated devices.
  • Increased efficiency: The optimized control values enable faster and more efficient imprinting processes, reducing production time and costs.
  • Enhanced process control: The method provides a systematic and controlled approach to optimize control values, allowing for better process control and repeatability.


Original Abstract Submitted

Some devices, systems, and methods obtain a set of relationship values, wherein the set of relationship values indicates relationships between control values for an imprint apparatus and corresponding overlay corrections; and estimate a set of control values based on a constrained optimization that uses the set of relationship values such that the set of control values globally minimizes a residual overlay error while the set of control values is maintained within a set of operating constraints, wherein the set of control values includes a set of in-plane control values that are in a plane and a set of out-of-plane control values that are out of the plane, wherein the plane is parallel to a template-substrate interface.

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