18318801. IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)

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IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD

Organization Name

CANON KABUSHIKI KAISHA

Inventor(s)

TOSHIHIKO Nishida of Tochigi (JP)

IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract

This abstract first appeared for US patent application 18318801 titled 'IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD

Simplified Explanation

The patent application describes an imprint apparatus that can control the pressure applied to a substrate during the imprinting process. The apparatus includes a substrate holding unit with multiple independently controlled holding regions, a first obtaining unit to measure the pressing force between the mold and the imprint material on the substrate, and a control unit to adjust the pressure on each holding region based on the obtained information. The goal is to ensure that the deformation of the substrate caused by the pressing force remains within an acceptable range.

  • The imprint apparatus has a substrate holding unit with multiple holding regions that can independently control the pressure applied to the substrate.
  • A first obtaining unit measures the pressing force between the mold and the imprint material on the substrate.
  • A control unit adjusts the pressure on each holding region based on the measured pressing force to prevent excessive deformation of the substrate.

Potential Applications

  • This technology can be used in the manufacturing of microelectronics, such as integrated circuits and microchips.
  • It can also be applied in the production of optical devices, such as lenses and displays.
  • The imprint apparatus can be utilized in the fabrication of nanoscale structures for various applications, including sensors and biomedical devices.

Problems Solved

  • The imprint apparatus solves the problem of excessive deformation of the substrate during the imprinting process.
  • By controlling the pressure applied to the substrate, it ensures that the imprinting is performed within an allowable range, preventing damage or distortion of the substrate.
  • The apparatus provides a more precise and controlled imprinting process, resulting in higher quality and accuracy of the final product.

Benefits

  • The ability to independently control the pressure on each holding region allows for fine-tuning and optimization of the imprinting process.
  • By preventing excessive deformation, the apparatus improves the yield and reliability of the manufacturing process.
  • The technology enables the production of complex and intricate patterns with high precision and accuracy.


Original Abstract Submitted

An imprint apparatus including a substrate holding unit including a plurality of holding regions whose pressures to a substrate are independently controlled, and configured to hold the substrate on the plurality of holding regions, a first obtaining unit configured to obtain first information about a pressing force applied to a mold when the mold and an imprint material on the substrate are brought into contact with each other, and a control unit configured to control, based on the first information obtained by the first obtaining unit, the pressure between the substrate and each of the plurality of holding regions in a state in which the mold and the imprint material on the substrate are in contact with each other such that deformation that occurs in the substrate due to the pressing force falls within an allowable range.

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