20240027919. MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS simplified abstract (KLA Corporation)

From WikiPatents
Jump to navigation Jump to search

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

Organization Name

KLA Corporation

Inventor(s)

Jonathan Madsen of Los Altos CA (US)

Andrei V. Shchegrov of Campbell CA (US)

Amnon Manassen of Haifa (IL)

Andrew V. Hill of Sunriver OR (US)

Yossi Simon of Qiryat Atta (IL)

Gilad Laredo of Haifa (IL)

Yoram Uziel of Migdal Ha'emek (IL)

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240027919 titled 'MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

Simplified Explanation

The abstract describes a multi-column metrology tool that has multiple measurement columns distributed along a vertical direction. These columns simultaneously probe multiple measurement regions on a sample, which includes metrology targets. Each measurement column consists of an illumination sub-system to direct light onto the sample, a collection sub-system with a collection lens to collect measurement signals from the sample, and one or more detectors to receive the collected signals. The tool also includes a column-positioning sub-system to adjust the position of the collection lens within each measurement column. The measurement region of each column is defined by the field of view of the collection lens and the range of the positioning system in the lateral plane. Additionally, the tool has a sample-positioning sub-system that scans the sample along a different path than the column direction to position metrology targets within the measurement regions of the measurement columns for measurements.

  • The multi-column metrology tool has two or more measurement columns distributed along a vertical direction.
  • Each measurement column includes an illumination sub-system, a collection sub-system, and a column-positioning sub-system.
  • The illumination sub-system directs light onto the sample.
  • The collection sub-system collects measurement signals from the sample using a collection lens and directs them to one or more detectors.
  • The column-positioning sub-system adjusts the position of the collection lens within each measurement column.
  • The measurement region of each column is defined by the field of view of the collection lens and the range of the positioning system in the lateral plane.
  • The sample-positioning sub-system scans the sample along a different path than the column direction to position metrology targets within the measurement regions for measurements.

Potential Applications:

  • Semiconductor manufacturing: The multi-column metrology tool can be used for measuring critical dimensions and other parameters of semiconductor devices during the manufacturing process.
  • Nanotechnology: The tool can be applied in nanoscale research and development to measure and characterize nanostructures and nanomaterials.
  • Material science: It can be used for analyzing the properties and characteristics of various materials, such as thin films, coatings, and surfaces.

Problems Solved:

  • Increased efficiency: Simultaneous probing of multiple measurement regions allows for faster and more efficient metrology measurements.
  • Accurate measurements: The tool's precise positioning and collection systems ensure accurate and reliable measurement data.
  • Versatility: The ability to adjust the position of the collection lens and scan the sample along different paths enables measurements on various metrology targets.

Benefits:

  • Time-saving: Simultaneous probing reduces the time required for metrology measurements, increasing overall productivity.
  • Improved accuracy: The tool's advanced positioning and collection systems enhance measurement accuracy, leading to better quality control.
  • Flexibility: The adjustable positioning and scanning capabilities make the tool adaptable to different sample types and measurement requirements.


Original Abstract Submitted

a multi-column metrology tool may include two or more measurement columns distributed along a column direction, where the two or more measurement columns simultaneously probe two or more measurement regions on a sample including metrology targets. a measurement column may include an illumination sub-system to direct illumination to the sample, a collection sub-system including a collection lens to collect measurement signals from the sample and direct it to one or more detectors, and a column-positioning sub-system to adjust a position of the collection lens. a measurement region of a measurement column may be defined by a field of view of the collection lens and a range of the positioning system in the lateral plane. the tool may further include a sample-positioning sub-system to scan the sample along a scan path different than the column direction to position metrology targets within the measurement regions of the measurement columns for measurements.

Retrieved from "http://wikipatents.org/index.php?title=20240027919._MASSIVE_OVERLAY_METROLOGY_SAMPLING_WITH_MULTIPLE_MEASUREMENT_COLUMNS_simplified_abstract_(KLA_Corporation)&oldid=29754"