18230472. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD
Organization Name
Inventor(s)
Kyeongbeom Park of Suwon-si (KR)
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18230472 titled 'SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD
Simplified Explanation
The patent application describes a substrate processing apparatus with a chamber for processing substrates, a light source to harden photoresist patterns on the substrate, and a transparent division part separating the light source from the substrate.
- Chamber with internal space for substrate processing
- Light source for emitting light to harden photoresist pattern on substrate
- Transparent division part separating light source and substrate
- Division of chamber into first space for light source and second space for substrate
Potential Applications
The technology can be used in semiconductor manufacturing, photolithography processes, and other industries requiring precise substrate processing.
Problems Solved
This innovation helps in achieving uniform and accurate hardening of photoresist patterns on substrates, improving overall quality and efficiency in manufacturing processes.
Benefits
- Enhanced precision in substrate processing - Improved quality of photoresist patterns - Increased efficiency in manufacturing processes
Original Abstract Submitted
A substrate processing apparatus includes a chamber having an internal space configured to process a substrate loaded therein; a light source configured to emit light on the substrate to harden a photoresist pattern coated on the substrate; and a transparent division part provided between the substrate and the light source, wherein the transparent division part divides the chamber into a first space, in which the light source is provided, and a second space, in which the substrate is provided.
