18368995. EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
Contents
- 1 EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 How does this technology compare to traditional methods of producing hydrogen radicals in a vacuum chamber?
- 1.11 What are the specific industries that could benefit the most from this technology?
- 1.12 Original Abstract Submitted
EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS
Organization Name
Inventor(s)
Katsunobu Nishihara of Yokohama (JP)
Nozomi Tanaka of Yokohama (JP)
Tomoyuki Johzaki of Yokohama (JP)
Atsushi Sunahara of Yokohama (JP)
Shinji Ueyama of Yokohama (JP)
Shinsuke Fujioka of Yokohama (JP)
EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18368995 titled 'EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS
Simplified Explanation
The exposure apparatus described in the patent application includes a droplet supplier, an irradiator, a condensing mirror, a gas supplier, a controller, and an exhaust pump.
- The droplet supplier supplies a target droplet inside a vacuum chamber.
- The irradiator irradiates a pulsed laser onto the target droplet.
- The condensing mirror condenses the light emitted from the target droplet by the pulsed laser irradiation.
- The gas supplier flows a hydrogen gas along the surface of the condensing mirror.
- The controller changes the supply condition of the target droplet and the irradiation condition of the pulsed laser to increase the production of hydrogen radicals in the vacuum chamber.
- The exhaust pump exhausts gas from inside the vacuum chamber.
Potential Applications
This technology could be applied in the fields of semiconductor manufacturing, nanotechnology, and materials science.
Problems Solved
This technology solves the problem of efficiently producing hydrogen radicals in a vacuum chamber for various industrial applications.
Benefits
The benefits of this technology include improved efficiency in production processes, enhanced control over chemical reactions, and increased productivity in manufacturing operations.
Potential Commercial Applications
The potential commercial applications of this technology include advanced semiconductor fabrication, precision material deposition, and high-tech surface modification processes.
Possible Prior Art
One possible prior art for this technology could be the use of gas flow systems in vacuum chambers for chemical reactions and material processing.
Unanswered Questions
How does this technology compare to traditional methods of producing hydrogen radicals in a vacuum chamber?
This article does not provide a direct comparison between this technology and traditional methods of producing hydrogen radicals in a vacuum chamber.
What are the specific industries that could benefit the most from this technology?
The article does not specify the specific industries that could benefit the most from this technology.
Original Abstract Submitted
An exposure apparatus includes a droplet supplier to supply a target droplet inside a vacuum chamber, an irradiator irradiating a pulsed laser onto the target droplet, a condensing mirror installed inside the vacuum chamber and configured to condense a light emitted from the target droplet by irradiation of the pulsed laser onto the target droplet, a gas supplier to flow a hydrogen gas along a surface of the condensing mirror, a controller to change a supply condition of the target droplet and an irradiation condition of the pulsed laser to conditions different from conditions during an exposure operation to increase an amount of production of hydrogen radicals in the vacuum chamber, and an exhaust pump to exhaust a gas from an inside of the vacuum chamber.
