18521853. IMPRINT COMPOSITIONS WITH PASSIVATED NANOPARTICLES AND MATERIALS AND PROCESSES FOR MAKING THE SAME simplified abstract (Applied Materials, Inc.)
Contents
- 1 IMPRINT COMPOSITIONS WITH PASSIVATED NANOPARTICLES AND MATERIALS AND PROCESSES FOR MAKING THE SAME
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 IMPRINT COMPOSITIONS WITH PASSIVATED NANOPARTICLES AND MATERIALS AND PROCESSES FOR MAKING THE SAME - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
IMPRINT COMPOSITIONS WITH PASSIVATED NANOPARTICLES AND MATERIALS AND PROCESSES FOR MAKING THE SAME
Organization Name
Inventor(s)
Amita Joshi of Fremont CA (US)
Andrew Ceballos of Palo Alto CA (US)
Kenichi Ohno of Sunnyvale CA (US)
Rami Hourani of Santa Clara CA (US)
Ludovic Godet of Sunnyvale CA (US)
IMPRINT COMPOSITIONS WITH PASSIVATED NANOPARTICLES AND MATERIALS AND PROCESSES FOR MAKING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18521853 titled 'IMPRINT COMPOSITIONS WITH PASSIVATED NANOPARTICLES AND MATERIALS AND PROCESSES FOR MAKING THE SAME
Simplified Explanation
The present disclosure relates to imprint compositions for nanoimprint lithography containing passivated nanoparticles, solvents, surface ligands, additives, and acrylates.
- Passivated nanoparticles in the composition have cores with metal oxides and shells with passivation materials containing silicon compounds.
- The composition is designed for use in nanoimprint lithography processes.
Potential Applications
The technology can be applied in the manufacturing of nanoscale devices, such as semiconductors, sensors, and optical components.
Problems Solved
This technology helps in achieving high-resolution patterning at the nanoscale level, which is crucial for the development of advanced electronic and optical devices.
Benefits
The use of passivated nanoparticles in the composition improves the efficiency and accuracy of nanoimprint lithography processes, leading to enhanced device performance.
Potential Commercial Applications
The technology can be utilized in the semiconductor industry, nanotechnology research, and the production of high-performance optical devices.
Possible Prior Art
One possible prior art could be the use of traditional imprint compositions without passivated nanoparticles for nanoimprint lithography processes.
Unanswered Questions
How does the composition affect the adhesion properties of the imprinted patterns on different substrates?
The article does not provide information on the adhesion properties of the imprinted patterns and how they may vary on different substrates. Further research is needed to understand this aspect.
What is the long-term stability of the passivated nanoparticles in the composition during repeated imprinting processes?
The article does not address the long-term stability of the passivated nanoparticles in the composition over multiple imprinting cycles. Investigating this aspect is essential to assess the durability of the composition for industrial applications.
Original Abstract Submitted
Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more silicon-containing compounds.
