Samsung electronics co., ltd. (20240120287). OVERLAY MARK, MANUFACTURING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
Contents
- 1 OVERLAY MARK, MANUFACTURING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE USING THE SAME
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 OVERLAY MARK, MANUFACTURING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE USING THE SAME - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
OVERLAY MARK, MANUFACTURING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE USING THE SAME
Organization Name
Inventor(s)
Sang Won Park of Suwon-si (KR)
Byeong-Hwan Son of Suwon-si (KR)
Jung Hyun Choi of Suwon-si (KR)
OVERLAY MARK, MANUFACTURING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240120287 titled 'OVERLAY MARK, MANUFACTURING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE USING THE SAME
Simplified Explanation
The overlay mark in the patent application comprises a substrate, a lower overlay, a pattern layer, and an upper overlay with an opening on the pattern layer. The lower overlay does not overlap the upper overlay in the thickness direction of the substrate.
- Substrate
- Lower overlay
- Pattern layer
- Upper overlay with opening
- No overlap in thickness direction
Potential Applications
This technology could be applied in:
- Semiconductor manufacturing
- Microelectronics industry
Problems Solved
This technology helps in:
- Improving precision in overlay marks
- Enhancing the quality of pattern layers
Benefits
The benefits of this technology include:
- Increased accuracy in alignment
- Better control over the manufacturing process
Potential Commercial Applications
The potential commercial applications of this technology could be in:
- Semiconductor fabrication companies
- Electronics manufacturing industry
Possible Prior Art
One possible prior art could be the use of traditional overlay marks in semiconductor manufacturing processes.
Unanswered Questions
How does this technology impact production costs?
The article does not address the potential impact of this technology on production costs.
What are the environmental implications of this technology?
The article does not discuss the environmental implications of implementing this technology.
Original Abstract Submitted
provided is an overlay mark. the overlay mark comprises a substrate, a lower overlay in the substrate, a pattern layer on the substrate, and an upper overlay defining an opening on the pattern layer. the lower overlay does not overlap the upper overlay in a thickness direction of the substrate.
