20240053686. EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
MAMORU Kaneishi of Tochigi (JP)
EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240053686 titled 'EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD
Simplified Explanation
The patent application describes an exposure apparatus for exposing shot regions on a substrate, with a stage to hold and drive the substrate and a control unit to control the driving of the stage based on a driving profile.
- The driving profile is formed by connecting a first acceleration profile for non-exposure sections and a second acceleration profile for exposure sections, with the second profile being a curve.
- The control unit determines the acceleration profiles for each shot region based on information about the size of the region.
Potential applications of this technology:
- Semiconductor manufacturing
- Photolithography processes
- Display panel production
Problems solved by this technology:
- Ensures accurate and precise exposure of shot regions on the substrate
- Improves overall efficiency and productivity in manufacturing processes
Benefits of this technology:
- Enhanced control over acceleration and deceleration of the stage
- Increased accuracy in exposing shot regions
- Reduction in production errors and waste
Original Abstract Submitted
an exposure apparatus for exposing a plurality of shot regions on a substrate, including a stage configured to hold and drive the substrate, and a control unit configured to control driving of the stage based on a driving profile that defines the driving of the stage, wherein the driving profile is formed by connecting a first acceleration profile that controls acceleration/deceleration of the stage in a non-exposure section that does not include an exposure section where the shot region is exposed and a second acceleration profile that controls the acceleration/deceleration of the stage in the exposure section, the second acceleration profile is formed by a curve, and the control unit determines the first acceleration profile and the second acceleration profile for each of the plurality of shot regions based on information about a size of the shot region.
