18449779. DETECTION DEVICE, DETECTION METHOD, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
DETECTION DEVICE, DETECTION METHOD, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
DETECTION DEVICE, DETECTION METHOD, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18449779 titled 'DETECTION DEVICE, DETECTION METHOD, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
Simplified Explanation
The patent application describes a device that detects the relative position between two marks that are superimposed on each other.
- Illumination system illuminates the marks with a specific light.
- First detection system captures images of diffracted lights from the marks.
- Processor calculates the relative position between the marks.
- The illumination light and aperture stop are asymmetric to improve accuracy.
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- Potential Applications
- Industrial automation for precise positioning of components.
- Augmented reality for accurate alignment of virtual objects with real-world objects.
- Problems Solved
- Ensures accurate alignment of objects in various applications.
- Reduces human error in positioning tasks.
- Benefits
- Improved precision in positioning tasks.
- Increased efficiency in industrial processes.
- Enhanced user experience in augmented reality applications.
Original Abstract Submitted
Device detects a relative position between first and second marks arranged to be superimposed The device includes illumination system to illuminate the first and second marks with first illumination light, first detection system including first image sensor and first aperture stop and configured to form images of diffracted lights from the first and second marks illuminated with the first illumination light on the first image sensor via the first aperture stop, and processor to obtain the relative position between the first and second marks. The first illumination light forms first light intensity distribution asymmetric with respect to the optical axis of the illumination system on pupil surface of the illumination system, or the first aperture stop is asymmetric with respect to the optical axis of the first detection system.
