18361728. LITHOGRAPHY SYSTEM AND METHOD THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

LITHOGRAPHY SYSTEM AND METHOD THEREOF

Organization Name

Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor(s)

Shao-Hua Wang of Taoyuan City (TW)

Chueh-Chi Kuo of Kaohsiung City (TW)

Kuei-Lin Ho of Hsinchu County (TW)

Zong-You Yang of Hsinchu County (TW)

Cheng-Wei Sun of Hsinchu City (TW)

Wei-Yuan Chen of Hsinchu County (TW)

Cheng-Chieh Chen of Tainan City (TW)

Heng-Hsin Liu of New Taipei City (TW)

Li-Jui Chen of Hsinchu City (TW)

LITHOGRAPHY SYSTEM AND METHOD THEREOF - A simplified explanation of the abstract

This abstract first appeared for US patent application 18361728 titled 'LITHOGRAPHY SYSTEM AND METHOD THEREOF

Simplified Explanation

The patent application describes a lithography system that includes various components such as a table body, a wafer stage, sliding members, cables, brackets, rail guides, and protective films. The system allows for precise movement and positioning of the wafer stage during the lithography process.

• The first sliding member is connected to the wafer stage, allowing it to move along a track on the second sliding member, which is attached to the table body.
• A first cable is fixed by a bracket, which is part of a roller structure. The roller structure consists of a body and a wheel.
• The wheel of the roller structure moves along a rail guide, which restricts its movement.
• A first protective film is applied to the surface of the rail guide, providing a smooth surface for the roller structure to move along.

Potential applications of this technology:

• Lithography systems used in semiconductor manufacturing processes.
• Precision positioning and movement of the wafer stage during lithography.
• Ensuring smooth and controlled movement of components in a lithography system.

Problems solved by this technology:

• Provides a stable and controlled movement of the wafer stage during lithography, ensuring accurate positioning.
• Reduces friction and wear on the components involved in the movement.
• Protects the rail guide surface from damage or contamination.

Benefits of this technology:

• Improved accuracy and precision in lithography processes.
• Increased lifespan and reliability of the components involved in the movement.
• Reduced maintenance and downtime due to wear or damage.

Original Abstract Submitted

A lithography system includes a table body, a wafer stage, a first sliding member, a second sliding member, a first cable, a first bracket, a rail guide, and a first protective film. The first sliding member is coupled to the wafer stage. The second sliding member is coupled to an edge of the table body, in which the first sliding member is coupled to a track of the second sliding member. The first bracket fixes the first cable, the first bracket being coupled to a roller structure, in which the roller structure includes a body and a wheel coupled to the body. The rail guide confines a movement of the wheel of the roller structure. The first protective film is adhered to a surface of the rail guide, in which the roller structure is moveable along the first protective film on the surface of the rail guide.