20240036480. A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAST ONE PATTERNING DEVICE, LITHOGRAPHIC METHOD AND METROLOGY METHOD simplified abstract (ASML NETHERLANDS B.V.)

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A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAST ONE PATTERNING DEVICE, LITHOGRAPHIC METHOD AND METROLOGY METHOD

Organization Name

ASML NETHERLANDS B.V.

Inventor(s)

Armand Eugene Albert Koolen of Nuth (NL)

Simon Gijsbert Josephus Mathijssen of Rosmalen (NL)

Hui Quan Lim of Eindhoven (NL)

Amanda Elizabeth Anderson of Valkenswaard (NL)

A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAST ONE PATTERNING DEVICE, LITHOGRAPHIC METHOD AND METROLOGY METHOD - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240036480 titled 'A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAST ONE PATTERNING DEVICE, LITHOGRAPHIC METHOD AND METROLOGY METHOD

Simplified Explanation

The disclosed patent application describes a method for measuring a target on a substrate using measurement radiation. Here is a simplified explanation of the abstract:

  • The target on the substrate is illuminated with measurement radiation, which includes at least a first wavelength.
  • The scattered radiation resulting from the illumination is collected within a specific numerical aperture.
  • A parameter of interest is determined from the scattered radiation.
  • The target consists of a mediator periodic structure and at least a first target periodic structure, each in a different layer on the substrate.
  • The pitch of the mediator periodic structure is below the diffraction limit defined by the numerical aperture and the wavelength of the measurement radiation.
  • As a result, the scattered radiation includes double diffracted radiation, which is radiation that has undergone two sequential same-order diffractions of opposite sign.

Potential Applications of this Technology:

  • Optical metrology: The method can be used for precise measurements of targets on substrates, which can be useful in various industries such as semiconductor manufacturing, nanotechnology, and optics.
  • Surface characterization: The technique can provide valuable information about the periodic structures on the substrate, allowing for the analysis of surface properties and quality control.

Problems Solved by this Technology:

  • Diffraction limit: By utilizing the double diffracted radiation, the method overcomes the diffraction limit imposed by the numerical aperture and wavelength of the measurement radiation. This enables the measurement of targets with smaller pitches than previously possible.
  • Accurate parameter determination: The method allows for the determination of a parameter of interest from the scattered radiation, providing a reliable and precise measurement technique.

Benefits of this Technology:

  • Enhanced resolution: The ability to measure targets with pitches below the diffraction limit allows for higher resolution and finer details to be captured.
  • Improved measurement accuracy: By collecting and analyzing the scattered radiation, the method provides accurate and reliable measurements of the target on the substrate.
  • Versatility: The technique can be applied to various types of targets and substrates, making it adaptable to different industries and applications.


Original Abstract Submitted

disclosed is a method of measuring a target on a substrate comprising: illuminating a target with measurement radiation comprising at least a first wavelength, collecting the resultant scattered radiation within a collection numerical aperture; and determining a parameter of interest from said scattered radiation. the target comprises a mediator periodic structure and at least a first target periodic structure each in a respective different layer on the substrate, wherein a pitch of at least the mediator periodic structure is below a single diffraction limit defined by the collection numerical aperture and a wavelength of said measurement radiation, such that said scattered radiation comprises double diffracted radiation, said double diffracted radiation comprising radiation having undergone two sequential same-order diffractions of opposite sign.

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