18131436. OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AND METHOD OF MANUFACTURING MASK BY USING THE OPTICAL PROXIMITY CORRECTION METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AND METHOD OF MANUFACTURING MASK BY USING THE OPTICAL PROXIMITY CORRECTION METHOD
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OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AND METHOD OF MANUFACTURING MASK BY USING THE OPTICAL PROXIMITY CORRECTION METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18131436 titled 'OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AND METHOD OF MANUFACTURING MASK BY USING THE OPTICAL PROXIMITY CORRECTION METHOD
Simplified Explanation
The abstract describes an optical proximity correction (OPC) method that uses a Jacobian matrix to minimize edge placement errors (EPE) in a pattern. It also describes a method of manufacturing a mask using this OPC method. The method involves obtaining training data to calculate a differentiation Jacobian matrix of a mask segment's EPE, training an artificial neural network (ANN) to obtain a neural Jacobian matrix model using the training data, and applying the neural Jacobian matrix model to mask optimization (MO) to minimize the EPE.
- The OPC method uses a Jacobian matrix to minimize edge placement errors in a pattern.
- The method involves obtaining training data for calculating a differentiation Jacobian matrix of a mask segment's EPE.
- An artificial neural network (ANN) is trained using the training data to obtain a neural Jacobian matrix model.
- The neural Jacobian matrix model is applied to mask optimization to minimize the EPE.
Potential applications of this technology:
- Semiconductor manufacturing: This technology can be used in the manufacturing of semiconductor devices to improve the accuracy of pattern placement on masks, leading to better device performance.
- Photolithography: The OPC method can be applied in photolithography processes to enhance the precision of pattern transfer onto substrates, resulting in improved device functionality.
Problems solved by this technology:
- Edge placement errors: The OPC method addresses the issue of edge placement errors in patterns, which can negatively impact the performance and functionality of semiconductor devices.
- Mask optimization: The use of the neural Jacobian matrix model in mask optimization helps minimize edge placement errors, improving the overall quality of the manufactured masks.
Benefits of this technology:
- Improved device performance: By minimizing edge placement errors, this technology can enhance the performance and functionality of semiconductor devices.
- Enhanced manufacturing accuracy: The OPC method and neural Jacobian matrix model contribute to improved accuracy in mask manufacturing, leading to higher-quality devices.
- Cost savings: Minimizing edge placement errors reduces the need for rework or remanufacturing, resulting in cost savings for semiconductor manufacturers.
Original Abstract Submitted
An optical proximity correction (OPC) method using a Jacobian matrix, which may minimize an edge placement error (EPE) of an arbitrary pattern, and a method of manufacturing a mask by using the OPC method. The OPC method may include obtaining training data for calculating a differentiation Jacobian matrix of a mask segment of an EPE, obtaining a neural Jacobian matrix model through artificial neural network (ANN) training using the training data, and applying a prediction value based on the neural Jacobian matrix model to mask optimization (MO) to minimize the EPE.
