Taiwan semiconductor manufacturing company, ltd. (20240134293). SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTOR MANUFACTURING simplified abstract
Contents
- 1 SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTOR MANUFACTURING
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTOR MANUFACTURING - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTOR MANUFACTURING
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Yueh-Lin Yang of Tainan City (TW)
Chi-Hung Liao of New Taipei City (TW)
SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTOR MANUFACTURING - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240134293 titled 'SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTOR MANUFACTURING
Simplified Explanation
The semiconductor processing method described in the abstract involves selecting a target state of a reticle based on temperature profiles correlated to overlay performance, regulating the reticle to reach the target state, and performing an exposure process on a target workpiece using the reticle.
- The method involves selecting a target state of a reticle based on temperature profiles correlated to overlay performance.
- The reticle is regulated to reach the target state, ensuring that the deformation of the reticle remains substantially unchanged.
- An exposure process is then performed on a target workpiece using the reticle.
Potential Applications
This technology could be applied in semiconductor manufacturing processes where precise overlay performance is crucial.
Problems Solved
This technology helps in maintaining the deformation of the reticle at a desired state, ensuring consistent performance during the exposure process.
Benefits
The method ensures that the reticle remains in a stable state, leading to improved overlay performance and overall quality of semiconductor devices.
Potential Commercial Applications
One potential commercial application of this technology could be in the semiconductor industry for enhancing the accuracy and efficiency of semiconductor manufacturing processes.
Possible Prior Art
Prior art in this field may include methods for controlling the temperature and deformation of reticles during semiconductor processing to improve overlay performance.
Unanswered Questions
How does this technology impact the overall yield of semiconductor manufacturing processes?
This article does not provide information on how the described technology affects the yield of semiconductor manufacturing processes.
What are the potential cost implications of implementing this semiconductor processing method?
The article does not address the potential cost implications of implementing this semiconductor processing method.
Original Abstract Submitted
a semiconductor processing method includes: selecting a target state of a reticle based on a given data set, wherein the given data set comprises temperature profiles of the reticle correlated to a target overlay performance, and the target state is a state in which a deformation of the reticle is substantially unchanged; regulating the reticle to reach the target state; and performing an exposure process on a target workpiece by using the reticle.
