18489062. EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
- 1 EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18489062 titled 'EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
Simplified Explanation
The abstract describes an exposure apparatus for exposing multiple shot regions on a substrate, including a projection optical system, a drive mechanism, a detector, and a controller.
- Projection optical system: Projects a pattern onto an exposure region on the substrate.
- Drive mechanism: Moves the substrate.
- Detector: Measures the surface height of the substrate.
- Controller: Adjusts the substrate movement based on detector output.
Potential Applications
This technology can be applied in semiconductor manufacturing, photolithography, and other industries requiring precise exposure of patterns on substrates.
Problems Solved
1. Ensures accurate and consistent exposure of shot regions on the substrate. 2. Minimizes errors and defects in the manufacturing process.
Benefits
1. Improved quality and precision in pattern exposure. 2. Increased efficiency and productivity in manufacturing processes. 3. Reduces material waste and rework.
Potential Commercial Applications
"Precision Exposure Apparatus for Semiconductor Manufacturing"
Possible Prior Art
Prior exposure apparatus may have had limitations in detecting substrate surface height and adjusting substrate movement accordingly, leading to inconsistencies in pattern exposure.
Unanswered Questions
How does this technology compare to existing exposure apparatus in terms of speed and accuracy?
This article does not provide a direct comparison with existing exposure apparatus in terms of speed and accuracy. Further research or testing may be needed to determine the performance differences.
What are the potential maintenance requirements for this exposure apparatus?
The article does not address the potential maintenance requirements for this exposure apparatus. Understanding the maintenance needs can help in planning for long-term use and reliability.
Original Abstract Submitted
An exposure apparatus for exposing a plurality of shot regions on a substrate includes a projection optical system, a drive mechanism configured to drive the substrate, a detector configured to detect a surface height of the substrate, and a controller configured to control the drive mechanism based on an output of the detector. The projection optical system is configured to project a pattern of an original to an exposure region in an image plane of the projection optical system. A detection region of the detector is larger than the exposure region. The controller is configured to control, based on an output of the detector obtained when a first shot region of the plurality of shot regions is arranged in the exposure region, driving of the substrate, by the drive mechanism, for exposing a second shot region of the plurality of shot regions.
