Samsung electronics co., ltd. (20240094646). EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS simplified abstract
Contents
- 1 EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS
Organization Name
Inventor(s)
Katsunobu Nishihara of Yokohama (JP)
Nozomi Tanaka of Yokohama (JP)
Tomoyuki Johzaki of Yokohama (JP)
Atsushi Sunahara of Yokohama (JP)
Shinji Ueyama of Yokohama (JP)
Shinsuke Fujioka of Yokohama (JP)
EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240094646 titled 'EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS
Simplified Explanation
The exposure apparatus described in the patent application includes components such as a droplet supplier, an irradiator, a condensing mirror, a gas supplier, a controller, and an exhaust pump. These components work together to increase the production of hydrogen radicals in the vacuum chamber.
- Droplet supplier to supply a target droplet inside a vacuum chamber
- Irradiator to irradiate a pulsed laser onto the target droplet
- Condensing mirror to condense light emitted from the target droplet
- Gas supplier to flow hydrogen gas along the surface of the condensing mirror
- Controller to change supply and irradiation conditions to increase hydrogen radical production
- Exhaust pump to remove gas from inside the vacuum chamber
Potential Applications
The technology described in the patent application could have potential applications in industries such as semiconductor manufacturing, nanotechnology, and materials science.
Problems Solved
This technology solves the problem of efficiently increasing the production of hydrogen radicals in a vacuum chamber, which is crucial for certain manufacturing processes.
Benefits
The benefits of this technology include improved efficiency in production processes, increased control over radical production, and potentially higher quality end products.
Potential Commercial Applications
Potential commercial applications of this technology could include advanced semiconductor manufacturing equipment, nanomaterial synthesis systems, and research instruments for materials science laboratories.
Possible Prior Art
One possible prior art could be the use of similar techniques in plasma processing equipment for semiconductor manufacturing. These systems also rely on the production of radicals for etching and deposition processes.
Unanswered Questions
How does this technology compare to existing methods for radical production in vacuum chambers?
The article does not provide a direct comparison to existing methods for radical production in vacuum chambers. It would be interesting to know the efficiency and effectiveness of this new technology compared to traditional methods.
What are the potential limitations or challenges of implementing this technology in industrial settings?
The article does not address any potential limitations or challenges of implementing this technology in industrial settings. It would be important to understand factors such as cost, scalability, and maintenance requirements for widespread adoption.
Original Abstract Submitted
an exposure apparatus includes a droplet supplier to supply a target droplet inside a vacuum chamber, an irradiator irradiating a pulsed laser onto the target droplet, a condensing mirror installed inside the vacuum chamber and configured to condense a light emitted from the target droplet by irradiation of the pulsed laser onto the target droplet, a gas supplier to flow a hydrogen gas along a surface of the condensing mirror, a controller to change a supply condition of the target droplet and an irradiation condition of the pulsed laser to conditions different from conditions during an exposure operation to increase an amount of production of hydrogen radicals in the vacuum chamber, and an exhaust pump to exhaust a gas from an inside of the vacuum chamber.
