18455976. CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
Contents
- 1 CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE
Organization Name
Inventor(s)
HIROYUKI Maruyama of Tochigi (JP)
Tadayasu Nishikawa of Tochigi (JP)
CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18455976 titled 'CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE
Simplified Explanation
The patent application describes a cleaning apparatus designed to clean an original plate used in forming patterns on a substrate. The apparatus includes an irradiating unit that releases plasma onto one side of the original plate and a heating unit that radiates heat onto the other side, heating the plate in between.
- The cleaning apparatus is specifically configured for cleaning original plates used in imprinting processes.
- The apparatus utilizes plasma irradiation and heat radiation to effectively clean the original plate.
- The original plate is positioned between the irradiating unit and the heating unit for thorough cleaning.
Potential Applications
The technology can be applied in industries that involve imprinting processes, such as semiconductor manufacturing, nanotechnology, and microelectronics.
Problems Solved
The cleaning apparatus addresses the challenge of efficiently and effectively cleaning original plates used in forming patterns on substrates, ensuring high-quality and precise patterning.
Benefits
- Improved cleaning efficiency and effectiveness - Enhanced quality and precision in pattern formation - Extended lifespan of original plates
Potential Commercial Applications
The technology can be utilized in semiconductor fabrication facilities, research laboratories, and manufacturing plants for various electronic devices.
Possible Prior Art
One possible prior art could be the use of chemical cleaning solutions or mechanical scrubbing methods for cleaning original plates in imprinting processes.
Unanswered Questions
How does the cleaning apparatus compare to traditional cleaning methods for original plates in imprinting processes?
The article does not provide a direct comparison between the cleaning apparatus and traditional cleaning methods, leaving uncertainty about the advantages and disadvantages of each approach.
What are the specific parameters for plasma release and heat radiation in the cleaning apparatus?
The article does not detail the specific parameters or settings for plasma release and heat radiation, which could impact the effectiveness and efficiency of the cleaning process.
Original Abstract Submitted
[Problem] The provision of a cleaning apparatus that is useful in the cleaning of an original plate that is used when forming a pattern on top of a substrate. [Means for solving the problem] A cleaning apparatus configured to clean an original plate that is used when forming a pattern in an imprint material on top of a substrate; wherein the cleaning apparatus comprises an irradiating unit configured to release plasma onto a first side of the original plate; and a heating unit configured to radiate heat onto a second side of the original plate, and heat the original plate; and wherein the irradiating unit and the heating unit are disposed such that the original plate is interposed between the irradiating unit and the heating unit.
