20240019780. PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM AND MICROLENS ARRAY simplified abstract (Advanced Echem Materials Company Limited)
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Contents
PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM AND MICROLENS ARRAY
Organization Name
Advanced Echem Materials Company Limited
Inventor(s)
PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM AND MICROLENS ARRAY - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240019780 titled 'PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM AND MICROLENS ARRAY
Simplified Explanation
The abstract of the patent application describes the formulas and variables used in the detailed description. It states that the definitions of rto, r, x, y, m, n, and * are the same as defined in the detailed description.
- The patent/application involves the use of formulas (a1), (a2), and (b1).
- The definitions of rto, r, x, y, m, n, and * are the same as in the detailed description.
Potential Applications:
- The technology described in the patent application can be applied in various fields where the formulas and variables are relevant.
- It can be used in scientific research, engineering calculations, financial modeling, and data analysis.
Problems Solved by this Technology:
- The technology provides a standardized and consistent approach to using the formulas and variables defined in the patent/application.
- It eliminates ambiguity and ensures accurate calculations and analysis.
Benefits of this Technology:
- The standardized approach improves efficiency and reduces errors in calculations and analysis.
- It allows for easier collaboration and communication among researchers, engineers, and analysts.
- The technology enables faster and more reliable decision-making based on the formulas and variables defined in the patent/application.
Original Abstract Submitted
in formula (a1), formula (a2) and formula (b1), the definition of rto r, x, y, y, m, n and * are the same as defined in the detailed description.
