17386312. DEVICES, SYSTEMS, AND METHODS FOR THE TRANSFORMATION AND CROPPING OF DROP PATTERNS simplified abstract (CANON KABUSHIKI KAISHA)

DEVICES, SYSTEMS, AND METHODS FOR THE TRANSFORMATION AND CROPPING OF DROP PATTERNS

Organization Name

CANON KABUSHIKI KAISHA

Inventor(s)

Tom H. Rafferty of Austin TX (US)

Ahmed M. Hussein of Austin TX (US)

Byung-Jin Choi of Austin TX (US)

DEVICES, SYSTEMS, AND METHODS FOR THE TRANSFORMATION AND CROPPING OF DROP PATTERNS - A simplified explanation of the abstract

This abstract first appeared for US patent application 17386312 titled 'DEVICES, SYSTEMS, AND METHODS FOR THE TRANSFORMATION AND CROPPING OF DROP PATTERNS

Simplified Explanation

The patent application describes a method for obtaining images of a substrate with a feature pattern and using these images to determine the offset and angle of the feature pattern relative to the substrate. This information is then used to generate a transformation for a drop pattern.

• The method involves obtaining one or more images of a substrate with a feature pattern.
• The feature pattern's edges are determined based on the images.
• The offset and angle of the feature pattern relative to the substrate are determined using the edges.
• A transformation for a drop pattern is generated based on the offset and angle of the feature pattern.

Potential Applications

• Manufacturing processes that require precise alignment of patterns on substrates.
• Printing processes that need accurate placement of patterns on various surfaces.
• Quality control in industries where precise pattern alignment is crucial.

Problems Solved

• Accurately determining the offset and angle of a feature pattern on a substrate.
• Generating a transformation for a drop pattern based on the feature pattern's alignment.
• Improving the efficiency and accuracy of manufacturing and printing processes.

Benefits

• Enhanced precision in aligning patterns on substrates.
• Improved quality control in manufacturing and printing processes.
• Increased efficiency and productivity in pattern alignment tasks.

Original Abstract Submitted

Some devices, systems, and methods obtain one or more images of a substrate, wherein the substrate includes a feature pattern; determine one or more edges of the feature pattern based on the one or more images; determine an offset of the feature pattern relative to the substrate and an angle of the feature pattern relative to the substrate based on the one or more edges of the feature pattern; and generate a transformation for a drop pattern based on the offset of the feature pattern and on the angle of the feature pattern.