18210548. MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES
Organization Name
Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor(s)
Yen-Shuo Su of Hsinchu City (TW)
Jui-Pin Wu of Hsinchu City (TW)
Chun-Lin Chang of Zhubei City (TW)
Han-Lung Chang of Kaohsiung City (TW)
Heng-Hsin Liu of New Taipei City (TW)
MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES - A simplified explanation of the abstract
This abstract first appeared for US patent application 18210548 titled 'MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES
Simplified Explanation
The patent application describes an apparatus for manufacturing semiconductors that includes a power amplifier, a catalyst, an inlet port, and an exhaust port. During a cleaning operation, a mixing gas is introduced through the inlet port into the power amplifier, where it contacts a catalyst surface with a build-up. The mixing gas reacts with the build-up, generating gaseous by-products that are then removed through the exhaust port.
- The apparatus is used for manufacturing semiconductors.
- It includes a power amplifier to power a laser.
- A catalyst is placed in the power amplifier.
- An inlet port introduces a mixing gas into the power amplifier during a cleaning operation.
- The mixing gas contacts the catalyst surface with a build-up.
- The mixing gas reacts with the build-up, generating gaseous by-products.
- An exhaust port removes the gaseous by-products from the power amplifier.
Potential Applications
This technology can be applied in various semiconductor manufacturing processes, including but not limited to:
- Fabrication of integrated circuits
- Production of solar cells
- Manufacturing of microprocessors
Problems Solved
The apparatus addresses the following problems encountered in semiconductor manufacturing:
- Build-up on the catalyst surface can negatively impact the performance and efficiency of the power amplifier.
- Manual cleaning methods are time-consuming and may not effectively remove the build-up.
- The presence of build-up can lead to defects in the manufactured semiconductors.
Benefits
The use of this apparatus offers several benefits in semiconductor manufacturing:
- Improved performance and efficiency of the power amplifier by removing build-up on the catalyst surface.
- Enhanced reliability and quality of the manufactured semiconductors.
- Time and cost savings compared to manual cleaning methods.
- Increased productivity and throughput in the manufacturing process.
Original Abstract Submitted
An apparatus for manufacturing semiconductors includes a power amplifier to power a laser, a catalyst disposed in the power amplifier, an inlet port, and an exhaust port. The inlet port introduces a mixing gas to an interior of the power amplifier during a cleaning operation so that the mixing gas contacts a surface of the catalyst having a build-up thereon. The mixing gas reacts with and removes the build-up by generating gaseous by-products. The exhaust port removes the gaseous by-products from the power amplifier.
