Taiwan semiconductor manufacturing company, ltd. (20240103378). EUV Lithography System With 3D Sensing and Tunning Modules simplified abstract
Contents
- 1 EUV Lithography System With 3D Sensing and Tunning Modules
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 EUV Lithography System With 3D Sensing and Tunning Modules - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
EUV Lithography System With 3D Sensing and Tunning Modules
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Tzu-Jung Pan of New Taipei City (TW)
Kuan-Hung Chen of Taoyuan City (TW)
Sheng-Kang Yu of Hsinchu City (TW)
Shang-Chieh Chien of New Taipei City (TW)
Li-Jui Chen of Hsinchu City (TW)
Heng-Hsin Liu of New Taipei City (TW)
EUV Lithography System With 3D Sensing and Tunning Modules - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240103378 titled 'EUV Lithography System With 3D Sensing and Tunning Modules
Simplified Explanation
The present disclosure describes an extreme ultraviolet (EUV) lithography system with an integrated EUV control system designed to adjust the radiation source based on the analysis of a laser beam profile collected in a 3-dimensional mode.
- 3-dimensional diagnostic module (3DDM) collects laser beam profile
- Analysis module analyzes the laser beam profile
- Database stores the laser beam profile
- EUV control module adjusts the radiation source based on analysis
- Integration of modules for efficient control and adjustment
Potential Applications
The technology can be applied in semiconductor manufacturing, nanotechnology research, and advanced imaging systems.
Problems Solved
1. Ensures precise control and adjustment of the radiation source 2. Improves the quality and accuracy of lithography processes
Benefits
1. Enhanced performance and efficiency in lithography 2. Enables high-resolution imaging and manufacturing processes
Potential Commercial Applications
"Advanced EUV Lithography Control System for Semiconductor Manufacturing"
Possible Prior Art
Prior art may include existing lithography control systems and laser beam profiling technologies.
Unanswered Questions
How does the system handle variations in laser beam profiles?
The system may have algorithms to account for different profiles and adjust accordingly.
What is the expected lifespan of the components in the EUV control system?
The longevity of the components may vary based on usage and maintenance practices.
Original Abstract Submitted
the present disclosure provides an extreme ultraviolet (euv) lithography system including a radiation source and an euv control system integrated with the radiation source. the euv control system includes a 3-dimensional diagnostic module (3ddm) designed to collect a laser beam profile of a laser beam from the radiation source in a 3-dimensional (3d) mode, an analysis module designed to analyze the laser beam profile, a database designed to store the laser beam profile, and an euv control module designed to adjust the radiation source. the analysis module is coupled with the database and the euv control module. the database is coupled with the 3ddm and the analysis module. the euv control module is coupled with the analysis module and the radiation source.
