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Category:G03F7/20
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Pages in category "G03F7/20"
The following 104 pages are in this category, out of 104 total.
1
- 17386312. DEVICES, SYSTEMS, AND METHODS FOR THE TRANSFORMATION AND CROPPING OF DROP PATTERNS simplified abstract (CANON KABUSHIKI KAISHA)
- 17461744. LITHOGRAPHY CONTAMINATION CONTROL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17462695. NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17463328. SYSTEM AND METHOD OF DISCHARGING AN EUV MASK simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17520933. FEED-FORWARD AND UTILIZATION OF HEIGHT INFORMATION FOR METROLOGY TOOLS simplified abstract (International Business Machines Corporation)
- 17585942. METHODS AND SYSTEMS FOR INTEGRATED CIRCUIT PHOTOMASK PATTERNING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17589575. METHOD OF OVERLAY MEASUREMENT simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17638730. QUANTUM DOT LIGHT-EMITTING DEVICE AND MANUFACTURING METHOD THEREOF simplified abstract (BOE TECHNOLOGY GROUP CO., LTD.)
- 17697019. METHOD OF FORMING A PATTERN simplified abstract (Samsung Electronics Co., Ltd.)
- 17701520. ELECTRONIC DEVICE FOR MANUFACTURING SEMICONDUCTOR DEVICE AND OPERATING METHOD OF ELECTRONIC DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17745576. OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17815412. MEASURING DEVICE, MEASURING METHOD, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING PRODUCT simplified abstract (CANON KABUSHIKI KAISHA)
- 17816078. SYSTEM AND METHOD FOR GENERATING CONTROL VALUES FOR OVERLAY CONTROL OF AN IMPRINT TOOL simplified abstract (CANON KABUSHIKI KAISHA)
- 17837051. SEMICONDUCTOR DEVICE WITH GRATING STRUCTURE simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 17837543. PATTERNING LAYER MODIFICATION USING DIRECTIONAL RADICAL RIBBON BEAM simplified abstract (Applied Materials, Inc.)
- 17837712. METHOD AND SYSTEM FOR OVERLAY MEASUREMENT simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 17847111. TECHNOLOGIES FOR OVERLAY METROLOGY MARKS simplified abstract (Intel Corporation)
- 17847477. EUV COLLECTOR INSPECTION APPARATUS AND INSPECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- 17860139. METHOD OF GENERATING CURVE SUB-RESOLUTION ASSIST FEATURE (SRAF), METHOD OF VERIFYING MASK RULE CHECK (MRC), AND METHOD OF MANUFACTURING MASK INCLUDING METHOD OF GENERATING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17899263. ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY simplified abstract (META PLATFORMS, INC.)
- 17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17939293. APPARATUS FOR REMOVING RESIDUE OF EUV LIGHT SOURCE VESSEL simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17950001. Method and Apparatus for In-Situ Dry Development simplified abstract (TOKYO ELECTRON LIMITED)
- 17951580. MASK LAYOUT DESIGN METHOD, MASK AND INTEGRATED CIRCUIT MANUFACTURING METHODS, MASKS AND INTEGRATED CIRCUITS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17956919. METHOD OF FORMING A PATTERN OF SEMICONDUCTOR DEVICE OF A SEMICONDUCTOR DEVICE ON A SEMICONDUCTOR SUBSTRATE BY USING AN EXTREME ULTRAVIOLET MASK simplified abstract (Samsung Electronics Co., Ltd.)
- 17982761. METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING MOIRÉ PATTERNS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18062072. EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18100409. METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18103289. METHOD OF MANUFACTURING PHOTO MASKS AND SEMICONDUCTOR DEVICES simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18107427. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18120916. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18128574. MASKLESS EXPOSURE DEVICE AND DISPLAY DEVICE simplified abstract (SAMSUNG DISPLAY CO., LTD.)
- 18133118. METHOD FOR FORMING RESIST PATTERN BY USING EXTREME ULTRAVIOLET LIGHT AND METHOD FOR FORMING PATTERN BY USING THE RESIST PATTERN AS MASK simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18144622. ILLUMINATION CORRECTION APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18150012. CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION simplified abstract (Samsung Electronics Co., Ltd.)
- 18151163. LITHOGRAPHY SYSTEM AND OPERATION METHOD THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18151527. METHOD FOR LITHOGRAPHY IN SEMICONDUCTOR FABRICATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18151930. METHOD FOR USING RADIATION SOURCE APPARATUS simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18153242. INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18153708. METHOD OF OPERATING SEMICONDUCTOR APPARATUS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18164835. TARGET DEBRIS COLLECTION DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18164841. POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION simplified abstract (Samsung Electronics Co., Ltd.)
- 18203163. METHOD OF CORRECTING OVERLAY, METHOD OF CONTROLLING SEMICONDUCTOR PROCESS, AND SEMICONDUCTOR PROCESSING APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18230472. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18302375. CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18310073. SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18318801. IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18320387. EXTREME ULTRAVIOLET (EUV) MASK AND MANUFACTURING METHOD THEREOF simplified abstract (Samsung Electronics Co., Ltd.)
- 18325200. SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18326659. PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18361361. PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18446400. LITHOGRAPHY SYSTEM AND METHODS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18447404. DEPOSITION DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME simplified abstract (SAMSUNG DISPLAY CO., LTD.)
- 18517070. LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
2
- 20240085777.PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (samsung electronics co., ltd.)
- 20240085812.SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD simplified abstract (samsung electronics co., ltd.)
B
S
- SAMSUNG DISPLAY CO., LTD. patent applications on February 15th, 2024
- SAMSUNG DISPLAY CO., LTD. patent applications on February 1st, 2024
- SAMSUNG DISPLAY CO., LTD. patent applications on February 8th, 2024
- Samsung electronics co., ltd. (20240094633). CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240112933). SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240118627). METHOD OF CORRECTING OVERLAY, METHOD OF CONTROLLING SEMICONDUCTOR PROCESS, AND SEMICONDUCTOR PROCESSING APPARATUS simplified abstract
- Samsung electronics co., ltd. (20240124635). POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240126161). EXTREME ULTRAVIOLET (EUV) MASK AND MANUFACTURING METHOD THEREOF simplified abstract
- Samsung electronics co., ltd. (20240134290). MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract
- SAMSUNG ELECTRONICS CO., LTD. patent applications on April 11th, 2024
- Samsung Electronics Co., Ltd. patent applications on April 18th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on April 25th, 2024
- Samsung Electronics Co., Ltd. patent applications on April 4th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 1st, 2024
- Samsung Electronics Co., Ltd. patent applications on February 29th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 8th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 14th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 21st, 2024
T
- Taiwan semiconductor manufacturing co., ltd. (20240126170). METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PHOTORESIST COMPOSITION simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240126174). LITHOGRAPHY simplified abstract
- Taiwan Semiconductor manufacturing Co., Ltd. patent applications on April 18th, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240112912). PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on April 4th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on February 8th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 14th, 2024
U
- US Patent Application 17734981. CROSSLINKABLE PHOTORESIST FOR EXTREME ULTRAVIOLET LITHOGRAPHY simplified abstract
- US Patent Application 17747939. LITHOGRAPHY SYSTEM AND METHODS simplified abstract
- US Patent Application 17749037. WORKPIECE SUPPORT simplified abstract
- US Patent Application 17750151. SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM simplified abstract
- US Patent Application 18076591. SUBSTRATE WEIGHT MEASUREMENT APPARATUS, A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING APPARATUS simplified abstract
- US Patent Application 18125936. METHOD FOR FORMING PHOTORESIST PATTERN AND METHOD FOR FORMING PATTERN ON A SUBSTRATE simplified abstract
- US Patent Application 18232264. PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract
- US Patent Application 18232774. UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18359954. Mask Defect Prevention simplified abstract
- US Patent Application 18361402. BOTTOM ANTIREFLECTIVE COATING MATERIALS simplified abstract
- US Patent Application 18361878. PATTERN FIDELITY ENHANCEMENT simplified abstract
- US Patent Application 18362954. METHOD OF MAKING BIOCHIP HAVING A CHANNEL simplified abstract
- US Patent Application 18366397. EUV PHOTOMASK AND RELATED METHODS simplified abstract
- US Patent Application 18447425. SUB-RESOLUTION ASSIST FEATURES simplified abstract
- US Patent Application 18447441. PHOTORESIST WITH POLAR-ACID-LABILE-GROUP simplified abstract