US Patent Application 18232774. UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
Contents
UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Ming-Hui Weng of New Taipei City (TW)
Chen-Yu Liu of Kaohsiung City (TW)
Ching-Yu Chang of Yuansun Village (TW)
UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18232774 titled 'UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
Simplified Explanation
The patent application describes a polymer composition that includes a polymer with specific groups attached to its main chain. These groups are either photobase generator (PBG) groups, thermal base generator (TBG) groups, or a combination of both.
- The polymer composition includes a polymer with pendant PBG groups, pendant TBG groups, or a combination of both.
- PBG groups are capable of generating a base when exposed to light, while TBG groups generate a base when exposed to heat.
- The combination of pendant PBG and pendant TBG groups provides the polymer composition with the ability to generate a base under both light and heat conditions.
- The presence of these base generator groups in the polymer composition can be useful in various applications, such as photoresist materials or thermal imaging systems.
- The polymer composition offers improved control and versatility in generating bases, allowing for more precise and efficient processes in relevant applications.
Original Abstract Submitted
A polymer composition comprises a polymer having a main chain and pendant photobase generator (PBG) groups, pendant thermal base generator (TBG) groups, or a combination of pendant PBG and pendant TBG groups.
