17860139. METHOD OF GENERATING CURVE SUB-RESOLUTION ASSIST FEATURE (SRAF), METHOD OF VERIFYING MASK RULE CHECK (MRC), AND METHOD OF MANUFACTURING MASK INCLUDING METHOD OF GENERATING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
- 1 METHOD OF GENERATING CURVE SUB-RESOLUTION ASSIST FEATURE (SRAF), METHOD OF VERIFYING MASK RULE CHECK (MRC), AND METHOD OF MANUFACTURING MASK INCLUDING METHOD OF GENERATING THE SAME
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 METHOD OF GENERATING CURVE SUB-RESOLUTION ASSIST FEATURE (SRAF), METHOD OF VERIFYING MASK RULE CHECK (MRC), AND METHOD OF MANUFACTURING MASK INCLUDING METHOD OF GENERATING THE SAME - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Original Abstract Submitted
METHOD OF GENERATING CURVE SUB-RESOLUTION ASSIST FEATURE (SRAF), METHOD OF VERIFYING MASK RULE CHECK (MRC), AND METHOD OF MANUFACTURING MASK INCLUDING METHOD OF GENERATING THE SAME
Organization Name
Inventor(s)
Wooyong Cho of Hwaseong-si (KR)
Useong Kim of Hwaseong-si (KR)
METHOD OF GENERATING CURVE SUB-RESOLUTION ASSIST FEATURE (SRAF), METHOD OF VERIFYING MASK RULE CHECK (MRC), AND METHOD OF MANUFACTURING MASK INCLUDING METHOD OF GENERATING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 17860139 titled 'METHOD OF GENERATING CURVE SUB-RESOLUTION ASSIST FEATURE (SRAF), METHOD OF VERIFYING MASK RULE CHECK (MRC), AND METHOD OF MANUFACTURING MASK INCLUDING METHOD OF GENERATING THE SAME
Simplified Explanation
The patent application describes a method for generating a curvilinear sub-resolution assist feature (SRAF) that meets mask rule check (MRC) conditions. It also includes a verification method for easy MRC verification of the curvilinear SRAF and a mask manufacturing method using the same.
- The method involves generating a curve axis for the curvilinear SRAF corresponding to a main feature.
- Curve points are then generated on the line of the curve axis.
- The curvilinear SRAF is generated based on these curve points.
Potential applications of this technology:
- Semiconductor manufacturing
- Mask manufacturing
Problems solved by this technology:
- Generating a curvilinear SRAF that meets MRC conditions can be challenging.
- The method simplifies the process of generating a curvilinear SRAF.
Benefits of this technology:
- Easy generation of curvilinear SRAF
- Improved MRC verification process
- Simplified mask manufacturing process
Original Abstract Submitted
Disclosed is a method of generating a curvilinear sub-resolution assist feature (SRAF) capable of easily generating a curvilinear SRAF satisfying mask rule check (MRC) conditions, an MRC verification method for easy MRC verification of the curvilinear SRAF, and a mask manufacturing method including the method of generating the same. The method of generating a curvilinear SRAF includes generating a curve axis for generating the curvilinear SRAF corresponding to a main feature, generating curve points on a line of the curve axis, and generating the curvilinear SRAF based on the curve points.
