Samsung electronics co., ltd. (20240094633). CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION simplified abstract

CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION

Organization Name

samsung electronics co., ltd.

Inventor(s)

Jungha Chae of Suwon-si (KR)

Haengdeog Koh of Suwon-si (KR)

Yoonhyun Kwak of Suwon-si (KR)

Minsang Kim of Suwon-si (KR)

Hana Kim of Suwon-si (KR)

Hyeran Kim of Suwon-si (KR)

Youngmin Nam of Suwon-si (KR)

Changheon Lee of Suwon-si (KR)

Kyuhyun Im of Suwon-si (KR)

CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240094633 titled 'CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION

Simplified Explanation

The patent application is for a carboxylate salt represented by formula 1, a photoresist composition containing this salt, and a method of forming a pattern using the photoresist composition.

• Carboxylate salt represented by formula 1
• Photoresist composition including the carboxylate salt
• Method of forming a pattern using the photoresist composition

Potential Applications

The technology could be used in the semiconductor industry for photolithography processes.

Problems Solved

This technology can improve the resolution and quality of patterns formed during photolithography.

Benefits

- Enhanced pattern formation - Improved resolution - Increased efficiency in semiconductor manufacturing processes

Potential Commercial Applications

"Enhancing Photolithography Processes in Semiconductor Manufacturing"

Possible Prior Art

Prior art may include other photoresist compositions and methods of forming patterns in semiconductor manufacturing.

Unanswered Questions

How does this technology compare to existing photoresist compositions in terms of performance and cost-effectiveness?

The article does not provide a direct comparison with existing technologies in the market.

Are there any limitations or drawbacks to using this carboxylate salt in photoresist compositions?

The article does not mention any potential limitations or drawbacks associated with the use of this carboxylate salt.

Original Abstract Submitted

provided are a carboxylate salt represented by formula 1, a photoresist composition including the carboxylate salt represented by formula 1, and a method of forming a pattern by using the photoresist composition