17463328. SYSTEM AND METHOD OF DISCHARGING AN EUV MASK simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
Contents
SYSTEM AND METHOD OF DISCHARGING AN EUV MASK
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
Han-Lung Chang of Hsinchu (TW)
SYSTEM AND METHOD OF DISCHARGING AN EUV MASK - A simplified explanation of the abstract
This abstract first appeared for US patent application 17463328 titled 'SYSTEM AND METHOD OF DISCHARGING AN EUV MASK
Simplified Explanation
The abstract describes a system for unloading an EUV reticle from a chuck within an EUV scanner using a baseplate of an EUV pod. The baseplate has support pins that hold the reticle at a distance from the top surface of the baseplate to prevent particle contamination during unloading.
- The baseplate of an EUV pod is used to unload an EUV reticle from a chuck within an EUV scanner.
- The baseplate has support pins that extend from the top surface.
- When the reticle is unloaded onto the baseplate, the support pins hold it at a relatively large distance from the top surface.
- The support pins have a low resistance to ensure that particles do not travel from the baseplate to the reticle during unloading.
Potential Applications
- Semiconductor manufacturing
- Photolithography processes
Problems Solved
- Particle contamination during the unloading of an EUV reticle
- Ensuring the integrity and cleanliness of the reticle
Benefits
- Prevents particle contamination and damage to the reticle
- Improves the efficiency and reliability of EUV photolithography systems
Original Abstract Submitted
An EUV photolithography system utilizes a baseplate of an EUV pod to unload an EUV reticle from a chuck within an EUV scanner. The baseplate includes a top surface and support pins extending from the top surface. The when the reticle is unloaded onto the baseplate, the support pins hold the reticle at relatively large distance from the top surface of the baseplate. The support pins have a relatively low resistance. The large distance and low resistance help ensure that particles do not travel from the baseplate to the reticle during unloading.
