18062072. EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)

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EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING ARTICLE

Organization Name

CANON KABUSHIKI KAISHA

Inventor(s)

KAZUKI Ota of Tochigi (JP)

TAKAFUMI Miyaharu of Tochigi (JP)

YUKI Saito of Tochigi (JP)

MASAKI Imai of Saitama (JP)

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING ARTICLE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18062072 titled 'EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING ARTICLE

Simplified Explanation

The abstract describes an exposure apparatus that is used in the manufacturing of electronic devices. The apparatus includes a unit that obtains surface positions in a height direction for each exposure region on a substrate. A control unit then uses these surface positions to control the movement of a substrate stage in the height direction.

  • The obtainment unit collects surface positions in the height direction for each exposure region on a substrate.
  • The control unit uses the obtained surface positions to control the movement of the substrate stage in the height direction.
  • The control unit also calculates an approximate surface that represents the cross-sectional shape of the exposure region's surface.
  • For a first exposure region where the information related to the approximate surface is within a predetermined range, the control unit adjusts the driving based on a correction value obtained from a previously exposed approximate surface.

Potential Applications:

  • This technology can be used in the manufacturing of electronic devices, such as semiconductors and displays.
  • It can improve the accuracy and precision of the exposure process, leading to better quality and performance of the manufactured devices.

Problems Solved:

  • The exposure apparatus addresses the challenge of maintaining precise control over the movement of the substrate stage during the exposure process.
  • It solves the problem of variations in the surface positions of different exposure regions on the substrate.

Benefits:

  • The apparatus ensures accurate and consistent exposure across different regions of the substrate.
  • It improves the overall quality and yield of the manufactured electronic devices.
  • The technology reduces the need for manual adjustments and increases the efficiency of the manufacturing process.


Original Abstract Submitted

An exposure apparatus including an obtainment unit configured to obtain, for each of a plurality of exposure regions on a substrate, surface positions in a height direction in the exposure region, and a control unit configured to control, based on the obtained surface positions, driving of a substrate stage in the height direction, wherein the control unit obtains an approximate surface approximately representing a cross-sectional shape of a surface of the exposure region from the obtained surface positions obtained, and for a first exposure region for which information related to the approximate surface does not exceed a predetermined range, controls the driving based on a correction value related to the driving obtained from an approximate surface approximately representing a cross-sectional shape of a surface of the exposure region that has been exposed prior to the first exposure region.

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