18447404. DEPOSITION DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME simplified abstract (SAMSUNG DISPLAY CO., LTD.)

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DEPOSITION DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME

Organization Name

SAMSUNG DISPLAY CO., LTD.

Inventor(s)

Young Min Moon of Yongin-si (KR)

DEPOSITION DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18447404 titled 'DEPOSITION DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME

Simplified Explanation

The method described in the patent application involves manufacturing a display device by forming layers of light emitting materials and photosensitive patterns on a substrate, and then using a dry etching process to create emission layers based on the patterns.

  • The method includes forming a first light emitting material layer on a substrate.
  • A first photosensitive pattern is then formed on the first light emitting material layer.
  • A first emission layer is created using a dry etching process with the first photosensitive pattern as a mask.
  • The formation of the first photosensitive pattern involves irradiating vacuum ultraviolet rays to a photosensitive material layer.

Potential Applications

  • Manufacturing of display devices such as OLED screens.
  • Production of high-resolution and energy-efficient displays for electronic devices.

Problems Solved

  • Improved precision and efficiency in creating emission layers for display devices.
  • Enhanced performance and longevity of display screens.

Benefits

  • Higher quality and resolution in display devices.
  • Energy savings due to efficient manufacturing processes.
  • Extended lifespan of display screens.


Original Abstract Submitted

A method for manufacturing a display device according to an embodiment includes forming a first light emitting material layer on a substrate; forming a first photosensitive pattern on the first light emitting material layer; and forming a first emission layer according to a first dry etching process with the first photosensitive pattern as a mask, wherein the forming of a first photosensitive pattern includes irradiating vacuum ultraviolet rays to a photosensitive material layer.

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