18153708. METHOD OF OPERATING SEMICONDUCTOR APPARATUS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

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METHOD OF OPERATING SEMICONDUCTOR APPARATUS

Organization Name

Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor(s)

Shih-Ming Chang of Hsinchu County (TW)

Chiu-Hsiang Chen of Hsinchu County (TW)

Ru-Gun Liu of Hsinchu County (TW)

METHOD OF OPERATING SEMICONDUCTOR APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18153708 titled 'METHOD OF OPERATING SEMICONDUCTOR APPARATUS

Simplified Explanation

The abstract describes a method for operating a semiconductor apparatus that involves generating an air flow to remove particles from a photomask, and then irradiating the photomask with light through a covering structure.

  • The method involves generating an air flow to blow particles away from a photomask.
  • The photomask is moved over a covering structure to facilitate the removal of particles.
  • The photomask is then irradiated with light through a light transmission region of the covering structure.

Potential Applications

  • This method can be used in semiconductor manufacturing processes.
  • It can improve the quality and accuracy of photolithography processes.
  • It can be applied in the production of integrated circuits and other semiconductor devices.

Problems Solved

  • The method solves the problem of particles getting attached to the photomask during semiconductor manufacturing processes.
  • It addresses the issue of particle contamination that can negatively impact the quality and performance of semiconductor devices.
  • It helps to ensure the integrity of the photomask and improve the overall yield of the manufacturing process.

Benefits

  • The method improves the cleanliness and reliability of semiconductor manufacturing processes.
  • It reduces the risk of defects and errors caused by particle contamination.
  • It enhances the efficiency and accuracy of photolithography processes, leading to higher quality semiconductor devices.


Original Abstract Submitted

A method of operating a semiconductor apparatus includes generating an air flow that flows from a covering structure; causing a photomask to move over the covering structure such that particles attached to the photomask are blown away from the photomask by the air flow; and irradiating the photomask with light through a light transmission region of the covering structure.

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