17815412. MEASURING DEVICE, MEASURING METHOD, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING PRODUCT simplified abstract (CANON KABUSHIKI KAISHA)

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MEASURING DEVICE, MEASURING METHOD, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING PRODUCT

Organization Name

CANON KABUSHIKI KAISHA

Inventor(s)

Wataru Yamaguchi of Tochigi (JP)

MEASURING DEVICE, MEASURING METHOD, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING PRODUCT - A simplified explanation of the abstract

This abstract first appeared for US patent application 17815412 titled 'MEASURING DEVICE, MEASURING METHOD, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING PRODUCT

Simplified Explanation

The patent application describes a measuring device that can measure the position of a pattern using light.

  • The device includes a wavelength variable unit that can change the spectrum of the light based on the incident position of the light.
  • There is also a moving unit that can move the wavelength variable unit to change the incident position.
  • The device uses wavelength characteristic information and intensity characteristic information to determine the position of the wavelength variable unit.
  • The wavelength characteristic information shows the relationship between the position of the unit and the wavelength of the light transmitted through it.
  • The intensity characteristic information shows the relationship between the position of the unit and the intensity of the light from the pattern.

Potential applications of this technology:

  • Position measurement of patterns in various industries such as semiconductor manufacturing, printing, and optical inspection.
  • Alignment of optical components in devices like cameras, telescopes, and microscopes.

Problems solved by this technology:

  • Accurate and precise measurement of the position of patterns.
  • Ability to vary the spectrum of light to match different patterns and measurement requirements.

Benefits of this technology:

  • Improved accuracy and precision in position measurement.
  • Flexibility to adapt to different patterns and measurement needs.
  • Simplified and efficient measurement process.


Original Abstract Submitted

A measuring device for measuring a position of a pattern includes a wavelength variable unit configured to vary a spectrum of first light in accordance with an incident position at which the first light is incident to allow the first light to pass therethrough, and a moving unit configured to change the incident position by moving the wavelength variable unit. The wavelength variable unit is moved to a position based on wavelength characteristic information and intensity characteristic information, the wavelength characteristic information indicating a relationship between the position of the wavelength variable unit and a wavelength of the first light transmitted through the wavelength variable unit, the intensity characteristic information indicating a relationship between the position of the wavelength variable unit and an intensity of second light from the pattern illuminated with the first light transmitted through the wavelength variable unit.

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