18100409. METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

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METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL

Organization Name

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor(s)

Chi-Hung Liao of Hsinchu (TW)

Po-Ming Shih of Sanchong City (TW)

METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL - A simplified explanation of the abstract

This abstract first appeared for US patent application 18100409 titled 'METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL

Simplified Explanation

The patent application describes an apparatus designed to reduce hydrogen permeation of a mask used in generating extreme ultraviolet (EUV) radiation. The apparatus includes a mask stage, a hydrogen dispensing nozzle, and a trajectory correcting assembly.

  • The mask stage holds the mask during the generation of EUV radiation.
  • The hydrogen dispensing nozzle ejects hydrogen below the mask.
  • The trajectory correcting assembly consists of a correcting nozzle and a gas flow detector.
  • The correcting nozzle dispenses a flow adjusting gas to redirect the trajectory of the hydrogen away from the mask's edge, reducing hydrogen permeation.
  • The gas flow detector measures the airflow variation of the hydrogen after it has been adjusted by the flow adjusting gas.

Potential Applications

  • This technology can be applied in the field of extreme ultraviolet (EUV) lithography, which is used in semiconductor manufacturing.
  • It can also be used in other applications where reducing hydrogen permeation of a mask is important, such as in the production of microelectromechanical systems (MEMS) or nanotechnology.

Problems Solved

  • Hydrogen permeation of a mask can lead to degradation and reduced performance of the mask, affecting the quality of the generated extreme ultraviolet (EUV) radiation.
  • The apparatus solves the problem of hydrogen permeation by adjusting the trajectory of the hydrogen away from the mask's edge, reducing its permeation and potential damage.

Benefits

  • By reducing hydrogen permeation, the apparatus helps maintain the integrity and performance of the mask used in generating extreme ultraviolet (EUV) radiation.
  • Improved mask performance leads to better quality EUV radiation, which is crucial in semiconductor manufacturing and other applications.
  • The gas flow detector allows for precise measurement and control of the adjusted hydrogen airflow, ensuring optimal performance of the apparatus.


Original Abstract Submitted

An apparatus for reducing hydrogen permeation of a mask is provided when generating extreme ultraviolet (EUV) radiation. The apparatus includes a mask stage configured to hold the mask, a hydrogen dispensing nozzle configured to eject hydrogen below the mask, and a trajectory correcting assembly. The trajectory correcting assembly includes a correcting nozzle and a gas flow detector. The correcting nozzle is configured to dispense at least one flow adjusting gas to adjust a trajectory of the hydrogen away from the mask to reduce hydrogen permeation at an edge of the mask. The gas flow detector is configured to measure a variation of an airflow of the hydrogen adjusted by the at least one flow adjusting gas.

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