17520933. FEED-FORWARD AND UTILIZATION OF HEIGHT INFORMATION FOR METROLOGY TOOLS simplified abstract (International Business Machines Corporation)

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FEED-FORWARD AND UTILIZATION OF HEIGHT INFORMATION FOR METROLOGY TOOLS

Organization Name

International Business Machines Corporation

Inventor(s)

Daniel Schmidt of Niskayuna NY (US)

FEED-FORWARD AND UTILIZATION OF HEIGHT INFORMATION FOR METROLOGY TOOLS - A simplified explanation of the abstract

This abstract first appeared for US patent application 17520933 titled 'FEED-FORWARD AND UTILIZATION OF HEIGHT INFORMATION FOR METROLOGY TOOLS

Simplified Explanation

The patent application describes methods and systems for configuring a metrology tool. Here is a simplified explanation of the abstract:

  • A processor receives a height map of a sample from a device that generates wafer height maps.
  • The height map provides information about the heights of multiple features on the sample's surface.
  • These features are located on different focal planes.
  • Based on the height map, the processor generates settings for the metrology tool.

Potential Applications:

  • Semiconductor manufacturing: This technology can be used in the production of semiconductor wafers to configure metrology tools for accurate measurements of features on the wafer's surface.
  • Quality control: The metrology tool settings generated based on the height map can be used to ensure the quality and consistency of various products that require precise measurements.

Problems Solved:

  • Configuring metrology tools: The technology solves the problem of manually configuring metrology tools by automating the process based on the height map of the sample.
  • Accurate measurements: By generating settings based on the height map, the technology helps in obtaining accurate measurements of features on the sample's surface.

Benefits:

  • Efficiency: Automating the configuration process saves time and effort compared to manual configuration of metrology tools.
  • Precision: The generated settings based on the height map help in achieving precise measurements, improving the overall quality control process.
  • Adaptability: The technology can be used with different samples and surfaces, allowing for flexibility in various industries.


Original Abstract Submitted

Methods and systems for configuring a metrology tool are described. A processor can receive a height map of a sample from an apparatus configured to generate wafer height maps. The received height map can indicate height information of a plurality of features on a surface of the sample. The plurality of features can be located on a plurality of focal planes. The processor can generate settings for the metrology tool based on the height map of the sample.

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