18150012. CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION simplified abstract (Samsung Electronics Co., Ltd.)

CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Jungha Chae of Suwon-si (KR)

Haengdeog Koh of Suwon-si (KR)

Yoonhyun Kwak of Suwon-si (KR)

Minsang Kim of Suwon-si (KR)

Hana Kim of Suwon-si (KR)

Hyeran Kim of Suwon-si (KR)

Youngmin Nam of Suwon-si (KR)

Changheon Lee of Suwon-si (KR)

Kyuhyun Im of Suwon-si (KR)

CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION - A simplified explanation of the abstract

This abstract first appeared for US patent application 18150012 titled 'CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION

Simplified Explanation

The abstract of the patent application describes a carboxylate salt represented by Formula 1, a photoresist composition containing this salt, and a method of forming a pattern using this composition.

• Carboxylate salt represented by Formula 1
• Photoresist composition containing the carboxylate salt
• Method of forming a pattern using the photoresist composition

Potential Applications

The technology described in this patent application could be used in the manufacturing of electronic devices, such as semiconductors, by enabling the precise patterning of materials on substrates.

Problems Solved

This technology helps in achieving high-resolution patterns on substrates, which is crucial in the production of advanced electronic devices.

Benefits

The use of the carboxylate salt in the photoresist composition allows for improved resolution and accuracy in patterning, leading to enhanced performance of electronic devices.

Potential Commercial Applications

• Enhancing the manufacturing process of semiconductors
• Improving the quality and performance of electronic devices

Possible Prior Art

There may be prior art related to photoresist compositions and methods of forming patterns in the field of semiconductor manufacturing.

How does this technology compare to existing photoresist compositions in terms of resolution and performance?

This article does not provide a direct comparison with existing photoresist compositions in terms of resolution and performance. Further research or testing may be needed to determine the advantages of this technology over existing ones.

What are the specific steps involved in the method of forming a pattern using the photoresist composition?

The article does not detail the specific steps involved in the method of forming a pattern using the photoresist composition. Additional information or a more in-depth explanation may be required to understand the practical application of this technology.

Original Abstract Submitted

Provided are a carboxylate salt represented by Formula 1, a photoresist composition including the carboxylate salt represented by Formula 1, and a method of forming a pattern by using the photoresist composition