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Category:C23C16/52
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This category has the following 91 subcategories, out of 91 total.
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Pages in category "C23C16/52"
The following 166 pages are in this category, out of 166 total.
1
- 17864541. PLASMA CONTROL APPARATUS AND PLASMA PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)
- 17908798. SEMICONDUCTOR MANUFACTURING APPARATUS AND CLEANING METHOD OF SEMICONDUCTOR MANUFACTURING APPARATUS simplified abstract (Hitachi High-Tech Corporation)
- 17961214. LOAD LOCK CHAMBERS AND RELATED METHODS AND STRUCTURES FOR BATCH COOLING OR HEATING simplified abstract (Applied Materials, Inc.)
- 17971205. IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOSITION THEREON IN A LARGE PECVD CHAMBER simplified abstract (Applied Materials, Inc.)
- 18122574. APPARATUS AND METHODS FOR CONTROLLING SUBSTRATE TEMPERATURE DURING PROCESSING simplified abstract (Applied Materials, Inc.)
- 18133909. CANISTER, PRECURSOR TRANSFER SYSTEM HAVING THE SAME AND METHOD FOR MEASURING PRECURSOR REMAINING AMOUNT THEREOF simplified abstract (Samsung Electronics Co., Ltd.)
- 18197919. FLOW CONTROL METHOD USING PLASMA SYSTEM simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18215454. SUBSTRATE PROCESSING APPARATUS AND EXHAUST METHOD THEREOF simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18226854. SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUS simplified abstract (Kokusai Electric Corporation)
- 18227467. SEMICONDUCTOR MANUFACTURING APPARATUS, GAS SUPPLYING METHOD USING THE SAME, AND SEMICONDUCTOR MANUFACTURING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18244532. LIQUID RAW MATERIAL SUPPLYING METHOD AND GAS SUPPLY APPARATUS simplified abstract (TOKYO ELECTRON LIMITED)
- 18255407. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (TOKYO ELECTRON LIMITED)
- 18263920. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18275359. FILM FORMING DEVICE AND FILM FORMING METHOD simplified abstract (Tokyo Electron Limited)
- 18278276. TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS simplified abstract (Lam Research Corporation)
- 18354220. SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18357293. METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18377159. METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18381893. MULTIZONE REFLECTOR FOR TEMPERATURE PLANAR NON-UNIFORMITY (Applied Materials, Inc.)
- 18395006. PROCESS CHAMBER VOLUME ADJUSTMENT simplified abstract (ASM IP Holding B.V.)
- 18395801. REMOTE SOLID REFILL CHAMBER simplified abstract (ASM IP Holding B.V.)
- 18397635. THERMAL MONITOR FOR HIGH PRESSURE PROCESSING simplified abstract (ASM IP Holding B.V.)
- 18398796. METHODS FOR FORMING GAP-FILLING MATERIALS AND RELATED APPARATUS AND STRUCTURES simplified abstract (ASM IP Holding B.V.)
- 18398995. METHOD, SYSTEM AND APPARATUS FOR FORMING EPITAXIAL TEMPLATE LAYER simplified abstract (ASM IP Holding B.V.)
- 18419021. GAS SUPPLY SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)
- 18423636. Dynamic Phased Array Plasma Source For Complete Plasma Coverage Of A Moving Substrate simplified abstract (Applied Materials, Inc.)
- 18425048. DEPOSITION SYSTEM AND PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)
- 18451862. FILM FORMING METHOD AND ATMOSPHERIC PLASMA FILM FORMING APPARATUS simplified abstract (FUJIFILM Corporation)
- 18479233. ATOMIC LAYER DEPOSITION APPARATUS simplified abstract (Samsung Display Co., LTD.)
- 18484057. FAST SWITCHING GAS CIRCUITS AND PROCESSING CHAMBERS, AND RELATED METHODS AND APPARATUS, FOR GAS STABILIZATION (Applied Materials, Inc.)
- 18493614. DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF simplified abstract (Lam Research Corporation)
- 18500690. MULTI-FLOW GAS CIRCUITS, PROCESSING CHAMBERS, AND RELATED APPARATUS AND METHODS FOR SEMICONDUCTOR MANUFACTURING (Applied Materials, Inc.)
- 18517837. VAPOR PHASE PRECURSOR DELIVERY SYSTEM simplified abstract (ASM IP Holding B.V.)
- 18518393. SYSTEMS AND METHODS FOR CONTROLLING PRESSURE IN SUBSTRATE PROCESSING SYSTEMS simplified abstract (ASM IP Holding B.V.)
- 18519545. CONTROL SYSTEM OF DEPOSITION SOURCE simplified abstract (Samsung Display Co., LTD.)
- 18522825. PRECOAT METHOD FOR SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18540311. TUNABLE HARDWARE TO CONTROL RADIAL FLOW DISTRIBUTION IN A PROCESSING CHAMBER simplified abstract (Applied Materials, Inc.)
- 18544315. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD simplified abstract (Samsung Display Co., LTD.)
- 18546140. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18547481. NON-METAL INCORPORATION IN MOLYBDENUM ON DIELECTRIC SURFACES simplified abstract (Lam Research Corporation)
- 18552957. FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18558388. METHODS TO IMPROVE PRODUCTIVITY OF ADVANCED CVD W GAPFILL PROCESS simplified abstract (Applied Materials, Inc.)
- 18580603. INCREASING DEPOSITION RATES OF OXIDE FILMS (Lam Research Corporation)
- 18583059. DEPOSITION APPARATUS AND DEPOSITION METHOD simplified abstract (Tokyo Electron Limited)
- 18589845. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 18591336. SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18595374. SEGMENTED FORMATION OF GATE INTERFACE simplified abstract (Applied Materials, Inc.)
- 18604257. CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATION simplified abstract (Applied Materials, Inc.)
- 18609278. INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM simplified abstract (Tokyo Electron Limited)
- 18609379. RUNOUT AND WOBBLE MEASUREMENT FIXTURES simplified abstract (ASM IP Holding B.V.)
- 18611093. METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18616741. VOID FREE LOW STRESS FILL simplified abstract (Lam Research Corporation)
- 18624655. PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kokusai Electric Corporation)
- 18626047. SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME simplified abstract (Applied Materials, Inc.)
- 18652060. MEASUREMENT METHOD AND MEASUREMENT SYSTEM simplified abstract (Tokyo Electron Limited)
- 18666251. REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER MANUFACTURING simplified abstract (Applied Materials, Inc.)
- 18669753. SEMICONDUCTOR PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
- 18725253. FILM FORMING APPARATUS AND FILM FORMING METHOD (SHIN-ETSU CHEMICAL CO., LTD.)
- 18726285. DETERMINATION METHOD AND SUBSTRATE PROCESSING APPARATUS (Tokyo Electron Limited)
- 18732080. SYSTEM AND METHOD OF CLEANING PROCESS CHAMBER COMPONENTS simplified abstract (Applied Materials, Inc.)
- 18742451. DEPOSITION APPARATUS (Samsung Display Co., LTD.)
- 18763231. METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUS (Kokusai Electric Corporation)
- 18817577. ROTATING SUBSTRATE SUPPORT (ASM IP Holding B.V.)
- 18819238. FILM-FORMING METHOD AND FILM-FORMING APPARATUS (Tokyo Electron Limited)
- 18828277. SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS (Kioxia Corporation)
- 18884897. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM (Kokusai Electric Corporation)
- 18886400. METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM (Kokusai Electric Corporation)
- 18887572. PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROCESSING APPARATUS, AND RECORDING MEDIUM (Kokusai Electric Corporation)
- 18889183. SEMICONDUCTOR MANUFACTURING APPARATUS AND PROCESS (ASM IP Holding B.V.)
- 18889712. Substrate Processing Method, Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-transitory Computer-readable Recording Medium (Kokusai Electric Corporation)
- 18890180. Substrate Processing Apparatus, Substrate Processing Method, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording Medium (Kokusai Electric Corporation)
- 18891314. SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM (Kokusai Electric Corporation)
- 18891526. SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS (Kokusai Electric Corporation)
- 18895226. SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS (Lam Research Corporation)
- 18895787. SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUS (Kokusai Electric Corporation)
- 18907922. FILM-FORMING METHOD AND FILM-FORMING APPARATUS (Tokyo Electron Limited)
- 18907967. FILM-FORMING METHOD AND FILM-FORMING SYSTEM (Tokyo Electron Limited)
- 18913040. FILM-FORMING METHOD AND FILM-FORMING APPARATUS (Tokyo Electron Limited)
- 18917730. METHOD TO IMPROVE WAFER EDGE UNIFORMITY (Applied Materials, Inc.)
- 18923921. FILM FORMING METHOD AND PROCESSING SYSTEM (Tokyo Electron Limited)
- 18925862. METHOD AND SYSTEM FOR DEPOSITING METAL PHOSPHIDE (ASM IP Holding B.V.)
- 18943136. MULTI ZONE SPOT HEATING IN EPI (Applied Materials, Inc.)
- 18944529. PROCESSING APPARATUS AND PROCESSING METHOD (Tokyo Electron Limited)
- 18962380. SHOWERHEAD FOR PROCESS TOOL (Tokyo Electron Limited)
- 18964075. FILM FORMING METHOD AND FILM FORMING APPARATUS (Tokyo Electron Limited)
- 18964874. SUBSTRATE PROCESSING APPARATUS, CONTROL SYSTEM, AND CONTROL METHOD (Tokyo Electron Limited)
- 18967876. GAS-PHASE REACTOR SYSTEM INCLUDING A GAS DETECTOR (ASM IP Holding B.V.)
- 18972674. METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM (Kokusai Electric Corporation)
- 18973637. FILM FORMING APPARATUS (Tokyo Electron Limited)
- 18975622. SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE (Kokusai Electric Corporation)
- 18982168. SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS (Tokyo Electron Limited)
- 19002147. CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALLY ETCHING A WORKPIECE TO FROM A RECESS IN THE WORKPIECE AND SUBSTRATE PROCESSING SYSTEM (TOKYO ELECTRON LIMITED)
- 19007056. VAPOR ACCUMULATOR FOR CORROSIVE GASES WITH PURGING (Lam Research Corporation)
2
- 20240011156. DEPOSITION APPARATUS simplified abstract (Samsung Display Co., Ltd.)
- 20240018660. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 20240035158. DEPOSITING COATINGS ON AND WITHIN HOUSINGS, APPARATUS, OR TOOLS UTILIZING PRESSURIZED CELLS simplified abstract (Halliburton Energy Services, Inc.)
A
- Applied materials, inc. (20240247371). SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME simplified abstract
- Applied materials, inc. (20240304430). REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER MANUFACTURING simplified abstract
- Applied materials, inc. (20240339318). SEGMENTED FORMATION OF GATE INTERFACE simplified abstract
- Applied materials, inc. (20240410078). IN-SITU FILM GROWTH RATE MONITORING APPARATUS, SYSTEMS, AND METHODS FOR SUBSTRATE PROCESSING
- Applied Materials, Inc. (20240410773). Integrated Pressure Sensor for Process Chamber Assemblies
- Applied materials, inc. (20240410773). Integrated Pressure Sensor for Process Chamber Assemblies
- Applied materials, inc. (20250066915). FAST SWITCHING GAS CIRCUITS AND PROCESSING CHAMBERS, AND RELATED METHODS AND APPARATUS, FOR GAS STABILIZATION
- Applied materials, inc. (20250066918). MULTI ZONE SPOT HEATING IN EPI
- Applied materials, inc. (20250118539). METHOD TO IMPROVE WAFER EDGE UNIFORMITY
- Applied materials, inc. (20250129481). MULTIZONE REFLECTOR FOR TEMPERATURE PLANAR NON-UNIFORMITY
- Applied Materials, Inc. patent applications on April 10th, 2025
- Applied Materials, Inc. patent applications on April 24th, 2025
- Applied Materials, Inc. patent applications on December 12th, 2024
- Applied Materials, Inc. patent applications on February 13th, 2025
- Applied Materials, Inc. patent applications on February 27th, 2025
- Applied Materials, Inc. patent applications on February 6th, 2025
- Applied Materials, Inc. patent applications on January 23rd, 2025
- Applied Materials, Inc. patent applications on January 30th, 2025
- Applied Materials, Inc. patent applications on July 25th, 2024
- Applied Materials, Inc. patent applications on March 6th, 2025
- Applied Materials, Inc. patent applications on October 10th, 2024
- Applied Materials, Inc. patent applications on September 12th, 2024
B
K
S
- Samsung display co., ltd. (20240240320). PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD simplified abstract
- Samsung display co., ltd. (20240263300). CONTROL SYSTEM OF DEPOSITION SOURCE simplified abstract
- Samsung display co., ltd. (20240263309). ATOMIC LAYER DEPOSITION APPARATUS simplified abstract
- Samsung display co., ltd. (20250138082). DEPOSITION APPARATUS
- Samsung Display Co., LTD. patent applications on August 8th, 2024
- Samsung Display Co., LTD. patent applications on July 18th, 2024
- Samsung Display Co., LTD. patent applications on May 1st, 2025
- Samsung electronics co., ltd. (20240124972). CANISTER, PRECURSOR TRANSFER SYSTEM HAVING THE SAME AND METHOD FOR MEASURING PRECURSOR REMAINING AMOUNT THEREOF simplified abstract
- Samsung electronics co., ltd. (20240124979). SEMICONDUCTOR MANUFACTURING APPARATUS, GAS SUPPLYING METHOD USING THE SAME, AND SEMICONDUCTOR MANUFACTURING METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240209495). DEPOSITION SYSTEM AND PROCESSING SYSTEM simplified abstract
- Samsung electronics co., ltd. (20240279808). GAS SUPPLY SYSTEM simplified abstract
- Samsung electronics co., ltd. (20240355583). PLASMA PROCESSING APPARATUS simplified abstract
- Samsung electronics co., ltd. (20250075323). SUBSTRATE SUPPORT, THIN FILM PROCESSING DEVICE, AND THIN FILM DEPOSITION CONTROL METHOD USING THE SAME
- Samsung electronics co., ltd. (20250092522). SEMICONDUCTOR PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
- Samsung Electronics Co., Ltd. patent applications on April 18th, 2024
- Samsung Electronics Co., Ltd. patent applications on August 22nd, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on January 25th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 27th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 20th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 20th, 2025
- Samsung Electronics Co., Ltd. patent applications on March 6th, 2025
- Samsung Electronics Co., Ltd. patent applications on October 24th, 2024
T
- Taiwan semiconductor manufacturing co., ltd. (20240327985). GAS TUBE, GAS SUPPLY SYSTEM AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240376605). SYSTEM AND METHOD FOR DYNAMICALLY ADJUSTING THIN-FILM DEPOSITION PARAMETERS simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240379398). SEMICONDUCTOR PROCESSING TOOL AND METHOD OF OPERATION simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240379471). SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION simplified abstract
- Taiwan Semiconductor Manufacturing Company, LTD. patent applications on February 6th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024
- Tokyo electron limited (20240240324). CARBON HARD MASK, FILM FORMING APPARATUS, AND FILM FORMING METHOD simplified abstract
- Tokyo electron limited (20240295020). METHOD AND APPARATUS FOR EMBEDDING TUNGSTEN INTO RECESS FORMED ON SUBSTRATE simplified abstract
- Tokyo electron limited (20250129472). FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Tokyo electron limited (20250129479). FILM-FORMING METHOD AND FILM-FORMING SYSTEM
- Tokyo electron limited (20250129482). FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Tokyo electron limited (20250132167). FILM FORMING METHOD AND PROCESSING SYSTEM
- Tokyo Electron Limited patent applications on April 24th, 2025
- Tokyo Electron Limited patent applications on February 6th, 2025
- Tokyo Electron Limited patent applications on July 18th, 2024
- Tokyo Electron Limited patent applications on March 6th, 2025
- Tokyo Electron Limited patent applications on September 5th, 2024