DEPOSITION APPARATUS

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DEPOSITION APPARATUS

This abstract first appeared for US patent application 20250138082 titled 'DEPOSITION APPARATUS

Original Abstract Submitted

a deposition apparatus includes: a reaction chamber; a radio frequency (rf) power supply device configured to provide rf power to the reaction chamber; an rf sensing device configured to sense the rf power at each sub-unit time of each of multiple unit times; a computing device configured to compute an average value of intensities of the rf power measured at each sub-unit time of each of the unit times; and a fault detection and classification (fdc) device configured to: determine an occurrence of an arc based on the calculated average value of the intensities of the rf power; and generate a command signal based on the occurrence of the arc to control a reaction process.