Applied materials, inc. (20250129481). MULTIZONE REFLECTOR FOR TEMPERATURE PLANAR NON-UNIFORMITY
MULTIZONE REFLECTOR FOR TEMPERATURE PLANAR NON-UNIFORMITY
Organization Name
Inventor(s)
Muhannad Mustafa of Milpitas CA US
Aditya Chuttar of Sunnyvale CA US
MULTIZONE REFLECTOR FOR TEMPERATURE PLANAR NON-UNIFORMITY
This abstract first appeared for US patent application 20250129481 titled 'MULTIZONE REFLECTOR FOR TEMPERATURE PLANAR NON-UNIFORMITY
Original Abstract Submitted
vapor deposition processing chamber temperature control apparatus and vapor deposition processing chambers incorporating the temperature control apparatus are described. the temperature control apparatus has a base plate with a plurality of reflectors arranged in at least two annular zones, each annular zone separated into at least two sector zones. the reflectors are configured to decrease a specific side-to-side temperature non-uniformity profile of a heated substrate support positioned above the base plate in the vapor deposition processing chamber.