18964874. SUBSTRATE PROCESSING APPARATUS, CONTROL SYSTEM, AND CONTROL METHOD (Tokyo Electron Limited)
SUBSTRATE PROCESSING APPARATUS, CONTROL SYSTEM, AND CONTROL METHOD
Organization Name
Inventor(s)
Masatoshi Sato of Nirasaki City JP
SUBSTRATE PROCESSING APPARATUS, CONTROL SYSTEM, AND CONTROL METHOD
This abstract first appeared for US patent application 18964874 titled 'SUBSTRATE PROCESSING APPARATUS, CONTROL SYSTEM, AND CONTROL METHOD
Original Abstract Submitted
A substrate processing apparatus includes: a substrate processor including a plurality of end devices and performing substrate processing on a substrate by using the end devices; and a controller controlling the substrate processing in the substrate processor, wherein the controller includes a higher-level control unit and a plurality of control boards that are lower-level control units connected to the higher-level control unit via a network, and the control boards send or receive a control signal to or from the end devices and include a clock generator that performs time measurement, and wherein the controller includes a time deviation corrector that transmits a clock signal for a certain period of time from the higher-level control unit to the control boards and that corrects a deviation in actual operation time caused by the clock generator based on the clock signal from the higher-level control unit, in each of the control boards.