18944529. PROCESSING APPARATUS AND PROCESSING METHOD (Tokyo Electron Limited)
PROCESSING APPARATUS AND PROCESSING METHOD
Organization Name
Inventor(s)
Hiroki Iriuda of Yamanashi (JP)
Atsushi Endo of Yamanashi (JP)
PROCESSING APPARATUS AND PROCESSING METHOD
This abstract first appeared for US patent application 18944529 titled 'PROCESSING APPARATUS AND PROCESSING METHOD
Original Abstract Submitted
A processing apparatus includes: a processing container having a substantially cylindrical shape and provided with an exhaust slit on a side wall; and a first pair of gas nozzles extending in a vertical direction along an inside of the side wall of the processing container and disposed symmetrically with respect to a straight line extending from a center of the exhaust slit to a portion of the side wall positioned opposite to the exhaust slit via a center of the processing container; a second pair of gas nozzle disposed symmetrically with respect to the straight line; at least one memory storing executable instructions; and at least one processor configured to execute the executable instructions to: control the first pair of gas nozzles and the second pair of gas nozzles to eject a same processing gas into the processing container.