GAS SUPPLY SYSTEM

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Inventor(s)

GAS SUPPLY SYSTEM - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240279808 titled 'GAS SUPPLY SYSTEM

The gas supply system described in the patent application includes various components such as a manifold, cleaning gas supply line, inert gas supply lines, opening/closing valves, reaction gas supply line, source gas supply line, vaporizer, and controller.

The system is designed to supply gases for processing substrates in a process chamber efficiently.
A cleaning gas supply line delivers a cleaning gas to the manifold to maintain cleanliness during processing.
Inert gases are supplied through multiple lines to ensure the proper environment within the system.
Opening/closing valves control the flow of gases, allowing for precise regulation of gas supply.
The source gas supply line is equipped with a vaporizer to provide the necessary gas in vapor form.
A controller manages the operation of the entire system, ensuring optimal performance.

Potential Applications: - Semiconductor manufacturing processes - Thin film deposition - Solar cell production - LED manufacturing

Problems Solved: - Contamination control during processing - Precise gas flow regulation - Efficient gas supply management

Benefits: - Improved process reliability - Enhanced product quality - Reduced downtime for maintenance

Commercial Applications: Title: Advanced Gas Supply System for Semiconductor Manufacturing This technology can be utilized in semiconductor fabrication facilities to enhance production processes, improve product quality, and increase overall efficiency. The market implications include cost savings, higher yield rates, and competitive advantages in the semiconductor industry.

Questions about the gas supply system: 1. How does the system ensure precise gas flow regulation? The system utilizes opening/closing valves and inert gas supply lines to control the flow of gases accurately, ensuring optimal processing conditions.

2. What are the potential applications of this gas supply system beyond semiconductor manufacturing? The system can also be applied in various industries such as solar cell production, LED manufacturing, and thin film deposition for efficient gas supply management and contamination control.

Original Abstract Submitted

a gas supply system includes a manifold for supplying gases for processing the substrate to a process chamber; a cleaning gas supply line supplying a cleaning gas to the manifold; a first inert gas supply line supplying a first inert gas to the cleaning gas supply line; a first opening/closing valve opening and closing the cleaning gas supply line; a reaction gas supply line supplying a reaction gas to the manifold; a source gas supply line provided with a vaporizer and supplying the source gas to the manifold; a second inert gas supply line supplying a second inert gas to the manifold and branching out to a carrier gas supply line connected to the vaporizer and a curtain gas supply line bypassing the vaporizer; a second opening/closing valve selectively opening or closing the carrier gas supply line and the curtain gas supply line; and a controller.