18381893. MULTIZONE REFLECTOR FOR TEMPERATURE PLANAR NON-UNIFORMITY (Applied Materials, Inc.)
MULTIZONE REFLECTOR FOR TEMPERATURE PLANAR NON-UNIFORMITY
Organization Name
Inventor(s)
Muhannad Mustafa of Milpitas CA US
Aditya Chuttar of Sunnyvale CA US
MULTIZONE REFLECTOR FOR TEMPERATURE PLANAR NON-UNIFORMITY
This abstract first appeared for US patent application 18381893 titled 'MULTIZONE REFLECTOR FOR TEMPERATURE PLANAR NON-UNIFORMITY
Original Abstract Submitted
Vapor deposition processing chamber temperature control apparatus and vapor deposition processing chambers incorporating the temperature control apparatus are described. The temperature control apparatus has a base plate with a plurality of reflectors arranged in at least two annular zones, each annular zone separated into at least two sector zones. The reflectors are configured to decrease a specific side-to-side temperature non-uniformity profile of a heated substrate support positioned above the base plate in the vapor deposition processing chamber.