Samsung electronics co., ltd. (20240209495). DEPOSITION SYSTEM AND PROCESSING SYSTEM simplified abstract
DEPOSITION SYSTEM AND PROCESSING SYSTEM
Organization Name
Inventor(s)
Dongkwan Baek of Anyang-si (KR)
Hyungsuk Jung of Suwon-si (KR)
DEPOSITION SYSTEM AND PROCESSING SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240209495 titled 'DEPOSITION SYSTEM AND PROCESSING SYSTEM
The abstract describes a deposition system that includes a reaction chamber, a first gas supply unit, a reactant supply unit, and an exhaust unit. The first gas supply unit supplies a first precursor in a liquid state to the reaction chamber in a gaseous state, while the reactant supply unit provides a reactant to the reaction chamber. The exhaust unit discharges an exhaust material.
- The first gas supply unit consists of a first sub tank, a first liquid mass flow controller, and a first vaporizer.
- A first automatic refill system periodically fills the first sub tank with the liquid first precursor stored in the first main tank.
- The exhaust unit includes a processing chamber, a pump, and a scrubber with a plasma pretreatment system.
Potential Applications: - Thin film deposition processes in semiconductor manufacturing - Coating applications in the automotive industry - Solar cell production
Problems Solved: - Efficient delivery of precursor materials in gaseous form - Effective removal of exhaust materials - Automation of refill processes
Benefits: - Improved deposition process control - Reduced waste and environmental impact - Enhanced system reliability
Commercial Applications: "Advanced Deposition System for Semiconductor Manufacturing: Enhancing Thin Film Deposition Processes"
Prior Art: Researchers can explore prior patents related to chemical vapor deposition systems and exhaust treatment technologies.
Frequently Updated Research: Researchers in the field of semiconductor manufacturing are constantly developing new deposition techniques and materials for improved performance.
Questions about the technology: 1. How does the first gas supply unit ensure the precise delivery of the first precursor in a gaseous state? 2. What are the key advantages of using a plasma pretreatment system in the exhaust unit?
Original Abstract Submitted
a deposition system, includes: a reaction chamber; a first gas supply unit supplying a first precursor in a liquid state stored in a first main tank to the reaction chamber in a gaseous state; a reactant supply unit supplying a reactant to the reaction chamber; and an exhaust unit discharging an exhaust material, wherein the first gas supply unit includes a first sub tank, a first liquid mass flow controller, and a first vaporizer, the first precursor is supplied to the reaction chamber by passing through the first sub tank, the first liquid mass flow controller, and the first vaporizer, a first automatic refill system operates to periodically fill the first sub tank with the liquid first precursor stored in the first main tank, and the exhaust unit comprises a processing chamber, a pump, and a scrubber to which a plasma pretreatment system is applied.
