DEPOSITION APPARATUS

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DEPOSITION APPARATUS

This abstract first appeared for US patent application 18742451 titled 'DEPOSITION APPARATUS

Original Abstract Submitted

A deposition apparatus includes: a reaction chamber; a radio frequency (RF) power supply device configured to provide RF power to the reaction chamber; an RF sensing device configured to sense the RF power at each sub-unit time of each of multiple unit times; a computing device configured to compute an average value of intensities of the RF power measured at each sub-unit time of each of the unit times; and a fault detection and classification (FDC) device configured to: determine an occurrence of an arc based on the calculated average value of the intensities of the RF power; and generate a command signal based on the occurrence of the arc to control a reaction process.