CONTROL SYSTEM OF DEPOSITION SOURCE

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CONTROL SYSTEM OF DEPOSITION SOURCE - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240263300 titled 'CONTROL SYSTEM OF DEPOSITION SOURCE

The abstract describes a control system for a deposition source that includes a heater and deposits material on a substrate. The system includes a sensor to detect the amount of material deposited, a rate calculator to determine the deposition rate, and a filter to remove noise from the rate calculation, improving deposition quality by providing a stabilized signal.

The control system includes a deposition source with a heater for depositing material on a substrate.
A sensor is used to detect the amount of material deposited on the substrate.
A rate calculator calculates the first deposition rate based on the detected amount of material.
A filter removes noise from the first deposition rate to calculate a second deposition rate.
The system aims to improve deposition quality by providing a stabilized signal through noise removal.

Potential Applications: - Thin film deposition processes - Semiconductor manufacturing - Solar cell production - Optical coatings - Microelectronics fabrication

Problems Solved: - Inaccurate deposition rate calculations - Unstable deposition processes - Poor quality control in thin film deposition

Benefits: - Enhanced deposition quality - Improved process control - Increased efficiency in material usage - Consistent and reliable results - Cost savings in manufacturing processes

Commercial Applications: Title: Advanced Control System for Deposition Sources This technology can be utilized in industries such as semiconductor manufacturing, solar cell production, and optical coatings for improved deposition processes, quality control, and efficiency gains. The market implications include enhanced product performance, reduced material wastage, and increased competitiveness in the market.

Questions about the technology: 1. How does the control system improve deposition quality? The control system improves deposition quality by providing a stabilized signal through noise removal, ensuring accurate and consistent deposition rates. 2. What are the potential applications of this technology in the semiconductor industry? This technology can be applied in the semiconductor industry for thin film deposition processes, improving process control and product quality.

Original Abstract Submitted

a control system of a deposition source includes a deposition source that includes a heater and provides a deposition material on a substrate, a sensor that detects an amount of the deposition material provided to the substrate, a rate calculator that calculates a first deposition rate based on the amount of the deposition material provided to the substrate, and a filter that calculates a second deposition rate by removing a noise from the first deposition rate. the control system of the deposition source may improve deposition quality by a stabilized signal by removing noise.