Pages that link to "Category:Applied Materials, Inc."
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The following pages link to Category:Applied Materials, Inc.:
View (previous 50 | next 50) (20 | 50 | 100 | 250 | 500)- US Patent Application 18365527. DETERMINATION OF SUBSTRATE LAYER THICKNESS WITH POLISHING PAD WEAR COMPENSATION simplified abstract (← links)
- US Patent Application 17968608. OPERATION OF CLAMPING RETAINER FOR CHEMICAL MECHANICAL POLISHING simplified abstract (← links)
- US Patent Application 17968597. CLAMPING RETAINER FOR CHEMICAL MECHANICAL POLISHING simplified abstract (← links)
- US Patent Application 17974280. GROUNDING TECHNIQUES FOR ESD POLYMERIC FLUID LINES simplified abstract (← links)
- US Patent Application 18232421. MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS simplified abstract (← links)
- US Patent Application 18143747. METHOD TO IMPROVE DISPLAY EFFICIENCY AND UNIFORMITY OF AR WAVEGUIDE simplified abstract (← links)
- US Patent Application 17824282. METHODS AND MECHANISMS FOR PREVENTING FLUCTUATION IN MACHINE-LEARNING MODEL PERFORMANCE simplified abstract (← links)
- US Patent Application 17827204. SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DISTANCE simplified abstract (← links)
- US Patent Application 18303370. GA IMPLANT PROCESS CONTROL FOR ENHANCED PARTICLE PERFORMANCE simplified abstract (← links)
- US Patent Application 17871455. PROCESS KITS AND RELATED METHODS FOR PROCESSING CHAMBERS TO FACILITATE DEPOSITION PROCESS ADJUSTABILITY simplified abstract (← links)
- US Patent Application 17871505. PROCESS KITS AND RELATED METHODS FOR PROCESSING CHAMBERS TO FACILITATE DEPOSITION PROCESS ADJUSTABILITY simplified abstract (← links)
- US Patent Application 17829288. SITU CLEAN FOR BEVEL AND EDGE RING simplified abstract (← links)
- US Patent Application 17827652. LOW TEMPERATURE SILICON OXIDE GAP FILL simplified abstract (← links)
- US Patent Application 17827356. HIGHLY CONFORMAL METAL ETCH IN HIGH ASPECT RATIO SEMICONDUCTOR FEATURES simplified abstract (← links)
- US Patent Application 17824889. SELECTIVE METAL REMOVAL WITH FLOWABLE POLYMER simplified abstract (← links)
- US Patent Application 18082872. DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS simplified abstract (← links)
- US Patent Application 18233751. METHODS AND APPARATUS FOR MINIMIZING SUBSTRATE BACKSIDE DAMAGE simplified abstract (← links)
- US Patent Application 17974281. FLUID-TIGHT ELECTRICAL CONNECTION TECHNIQUES FOR SEMICONDUCTOR PROCESSING simplified abstract (← links)
- US Patent Application 17985632. OLED ANODE STRUCTURES INCLUDING AMORPHOUS TRANSPARENT CONDUCTING OXIDES AND OLED PROCESSING METHOD COMPRISING THE SAME simplified abstract (← links)
- US Patent Application 18231414. SPIN-ORBIT TORQUE MRAM STRUCTURE AND MANUFACTURE THEREOF simplified abstract (← links)
- 17835107. MOLTEN LIQUID TRANSPORT FOR TUNABLE VAPORIZATION IN ION SOURCES simplified abstract (Applied Materials, Inc.) (← links)
- 17835864. PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS simplified abstract (Applied Materials, Inc.) (← links)
- 17869987. APPARATUS FOR GENERATING ETCHANTS FOR REMOTE PLASMA PROCESSES simplified abstract (Applied Materials, Inc.) (← links)
- 18237673. ELECTROSTATIC CHUCK ASSEMBLY FOR CRYOGENIC APPLICATIONS simplified abstract (Applied Materials, Inc.) (← links)
- 17836657. PLASMA PRECLEAN SYSTEM FOR CLUSTER TOOL simplified abstract (Applied Materials, Inc.) (← links)
- 18237934. METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSES simplified abstract (Applied Materials, Inc.) (← links)
- 17837543. PATTERNING LAYER MODIFICATION USING DIRECTIONAL RADICAL RIBBON BEAM simplified abstract (Applied Materials, Inc.) (← links)
- 17839809. METHOD OF FORMING CARBON-BASED SPACER FOR EUV PHOTORESIST PATTERNS simplified abstract (Applied Materials, Inc.) (← links)
- 17837958. METHOD AND APPARATUS FOR ETCHING A SEMICONDUCTOR SUBSTRATE IN A PLASMA ETCH CHAMBER simplified abstract (Applied Materials, Inc.) (← links)
- 18198064. METHODS FOR PATTERNING SUBSTRATES TO ADJUST VOLTAGE PROPERTIES simplified abstract (Applied Materials, Inc.) (← links)
- 17748270. METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE simplified abstract (Applied Materials, Inc.) (← links)
- 17835711. AUTO FINE-TUNER FOR DESIRED TEMPERATURE PROFILE simplified abstract (Applied Materials, Inc.) (← links)
- 17839235. TAB ARRANGEMENT FOR RETAINING SUPPORT ELEMENTS OF SUBSTRATE SUPPORT simplified abstract (Applied Materials, Inc.) (← links)
- 18237669. SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES simplified abstract (Applied Materials, Inc.) (← links)
- Patent Applications Report for 13th Jan 2023 (← links)
- Patent Applications Report for 3rd Mar 2023 (← links)
- Patent Applications Report for 28th Apr 2023 (← links)
- 20240011153. CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER simplified abstract (Applied Materials, Inc.) (← links)
- 20240014028. ULTRAVIOLET AND OZONE CLEAN SYSTEM simplified abstract (Applied Materials, Inc.) (← links)
- 20240025009. POLISHING PADS HAVING SELECTIVELY ARRANGED POROSITY simplified abstract (Applied Materials, Inc.) (← links)
- 20240033878. MINIMIZING SUBSTRATE BOW DURING POLISHING simplified abstract (Applied Materials, Inc.) (← links)
- 20240038527. FORMING FILMS WITH IMPROVED FILM QUALITY simplified abstract (Applied Materials, Inc.) (← links)
- 20240040808. TECHNIQUES AND DEVICE STRUCTURE BASED UPON DIRECTIONAL SEEDING AND SELECTIVE DEPOSITION simplified abstract (Applied Materials, Inc.) (← links)
- Patent Applications Report for 2nd Feb 2024 (← links)
- 20240042574. DUAL MEMBRANE CARRIER HEAD FOR CHEMICAL MECHANICAL POLISHING simplified abstract (Applied Materials, Inc.) (← links)
- 20240043999. SINGLE PROCESS GAS FEED LINE ARCHITECTURE simplified abstract (Applied Materials, Inc.) (← links)
- 20240046096. PREDICTIVE MODELING OF A MANUFACTURING PROCESS USING A SET OF TRAINED INVERTED MODELS simplified abstract (Applied Materials, Inc.) (← links)
- 20240047185. SHARED RPS CLEAN AND BYPASS DELIVERY ARCHITECTURE simplified abstract (Applied Materials, Inc.) (← links)
- 20240047232. HIGH CONDUCTANCE DIVERT LINE ARCHITECTURE simplified abstract (Applied Materials, Inc.) (← links)
- 20240047256. CENTERING WAFER FOR PROCESSING CHAMBER simplified abstract (Applied Materials, Inc.) (← links)