20240011153. CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER simplified abstract (Applied Materials, Inc.)

From WikiPatents
Jump to navigation Jump to search

CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER

Organization Name

Applied Materials, Inc.

Inventor(s)

James D. Carducci of Sunnyvale CA (US)

Kenneth S. Collins of San Jose CA (US)

Kartik Ramaswamy of San Jose CA (US)

CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240011153 titled 'CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER

Simplified Explanation

The abstract describes a processing chamber with a chamber body and an access port. Inside the chamber, a cathode assembly generates a plasma. The chamber also includes a chamber liner with notch structures that engage with components of the chamber body. The chamber liner can move between a loading position and an operation position. In the loading position, the interior volume is accessible through the access port. In the operation position, the chamber liner partially encloses the interior volume.

  • The patent application describes a processing chamber with a movable chamber liner that can enclose the interior volume.
  • The chamber liner has notch structures that engage with components of the chamber body.
  • The chamber liner can move between a loading position and an operation position.
  • In the loading position, the interior volume is accessible through the access port.
  • In the operation position, the chamber liner partially encloses the interior volume.

Potential Applications:

  • Semiconductor manufacturing: The processing chamber can be used in the fabrication of semiconductor devices, where plasma processing is commonly employed.
  • Thin film deposition: The chamber liner can help create a controlled environment for depositing thin films onto substrates.
  • Surface treatment: The plasma generated by the cathode assembly can be used for surface cleaning, etching, or modification in various industries.

Problems Solved:

  • Contamination control: The chamber liner helps prevent contamination of the interior volume by enclosing it during operation.
  • Accessible loading: The loading position allows easy access to the interior volume for loading and unloading of samples or substrates.
  • Component protection: The notch structures of the chamber liner engage with components of the chamber body, providing protection and stability during operation.

Benefits:

  • Enhanced process control: The chamber liner helps maintain a consistent and controlled environment within the processing chamber, leading to improved process performance.
  • Reduced contamination risks: By enclosing the interior volume, the chamber liner minimizes the risk of contamination, resulting in higher quality products.
  • Efficient operation: The ability to move the chamber liner between loading and operation positions allows for convenient and streamlined processing workflows.


Original Abstract Submitted

a processing chamber includes a chamber body defining an interior volume and including an access port. a cathode assembly is configured to generate a plasma within the interior volume. a chamber liner includes one or more inner notch structures to engage with one or more components of the chamber body. the chamber liner is configured to move between a loading position and an operation position. when the chamber liner is in the loading position, the interior volume is accessible by the access port. when the chamber liner is in the operation position, the chamber liner at least partially encloses the interior volume.

Retrieved from "http://wikipatents.org/index.php?title=20240011153._CONTINUOUS_LINER_FOR_USE_IN_A_PROCESSING_CHAMBER_simplified_abstract_(Applied_Materials,_Inc.)&oldid=27529"