US Patent Application 17829288. SITU CLEAN FOR BEVEL AND EDGE RING simplified abstract
Contents
SITU CLEAN FOR BEVEL AND EDGE RING
Organization Name
Inventor(s)
Kaushik Alayavalli of Sunnyvale CA (US)
Andrew Nguyen of San Jose CA (US)
Edward Haywood of Santa Clara CA (US)
Malav Kapadia of Santa Clara CA (US)
SITU CLEAN FOR BEVEL AND EDGE RING - A simplified explanation of the abstract
This abstract first appeared for US patent application 17829288 titled 'SITU CLEAN FOR BEVEL AND EDGE RING
Simplified Explanation
- The patent application describes a method for cleaning a bevel area of a substrate support in a plasma processing chamber. - The method involves placing a cover substrate on the substrate support and providing a cleaning gas into the processing chamber. - A plasma is then created in the chamber, and the cleaning gas is directed through the substrate support to clean the bevel edge area. - The bevel edge area is the space between the outer diameter of the cover substrate and an edge ring on the substrate support.
Original Abstract Submitted
Embodiments disclosed herein include a method for cleaning a bevel area of a substrate support disposed within a plasma processing chamber. In one example the method begins by placing a cover substrate on a substrate support disposed in an interior volume of a processing chamber. A cleaning gas is provided into the interior volume of the processing chamber. A plasma is struck in the interior volume of the processing chamber. A cleaning gas is provided through the substrate support to a bevel edge area defined between an outer diameter of the cover substrate and an edge ring disposed on the substrate support.
