20240043999. SINGLE PROCESS GAS FEED LINE ARCHITECTURE simplified abstract (Applied Materials, Inc.)

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SINGLE PROCESS GAS FEED LINE ARCHITECTURE

Organization Name

Applied Materials, Inc.

Inventor(s)

Abhijit A. Kangude of San Jose CA (US)

Arun Chakravarthy Chakravarthy of Panruit (IN)

SINGLE PROCESS GAS FEED LINE ARCHITECTURE - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240043999 titled 'SINGLE PROCESS GAS FEED LINE ARCHITECTURE

Simplified Explanation

The abstract describes a semiconductor processing system that includes a gas splitter seated on a lid plate. The gas splitter has a top surface and multiple side surfaces, and it defines a gas inlet, one or more gas outlets, and one or more gas lumens. The gas lumens extend between the gas inlet and the gas outlets. A primary gas weldment is fluidly coupled to the gas inlet, and a gas panel includes two fluid sources that are each fluidly coupled to the primary gas weldment. Secondary gas weldments fluidly couple the gas outlets to respective processing chambers.

  • The semiconductor processing system includes a gas splitter that helps distribute gas in the system.
  • The gas splitter has a top surface and multiple side surfaces, and it defines a gas inlet, gas outlets, and gas lumens.
  • The gas lumens allow gas to flow between the gas inlet and the gas outlets.
  • A primary gas weldment is connected to the gas inlet to supply gas to the system.
  • A gas panel includes two fluid sources that are connected to the primary gas weldment.
  • Secondary gas weldments connect the gas outlets to the processing chambers.

Potential Applications:

  • Semiconductor manufacturing: This technology can be used in semiconductor processing systems to control the distribution of gas in different processing chambers.
  • Gas distribution systems: The gas splitter and gas weldments can be applied in various industries where precise gas distribution is required.

Problems Solved:

  • Efficient gas distribution: The gas splitter and gas weldments ensure that gas is evenly distributed among the processing chambers, improving the efficiency of semiconductor processing.
  • Contamination control: By controlling the gas flow, the system helps prevent cross-contamination between different processing chambers, ensuring the quality of semiconductor products.

Benefits:

  • Improved processing efficiency: The even distribution of gas ensures consistent processing conditions in each chamber, leading to improved yield and quality of semiconductor products.
  • Enhanced contamination control: By preventing cross-contamination, the system helps maintain the purity of each processing chamber, reducing defects in semiconductor devices.
  • Versatile gas distribution: The gas splitter and gas weldments can be customized to accommodate different gas sources and processing chamber configurations, making the system adaptable to various semiconductor manufacturing processes.


Original Abstract Submitted

exemplary semiconductor processing systems may a lid plate. a gas splitter may be seated on the lid plate. the gas splitter may include a top surface and a plurality of side surfaces. the gas splitter may defines a gas inlet, one or more gas outlets, and one or more gas lumens. the one or more gas lumens may extend between and fluidly couple the gas inlet with each of the one or more gas outlets. a primary gas weldment may extend to and fluidly couples to the gas inlet. a gas panel may include a first fluid source and a second fluid source that are each fluidly coupled with the primary gas weldment. one or more secondary gas weldments may extend between and fluidly couple each of the one or more gas outlets with a respective one of the plurality of processing chambers.

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