20240047185. SHARED RPS CLEAN AND BYPASS DELIVERY ARCHITECTURE simplified abstract (Applied Materials, Inc.)
Contents
SHARED RPS CLEAN AND BYPASS DELIVERY ARCHITECTURE
Organization Name
Inventor(s)
Abhijit A. Kangude of San Jose CA (US)
Badri N. Ramamurthi of Los Gatos CA (US)
Arun Chakravarthy Chakravarthy of Panruit (IN)
Vinay K. Prabhakar of Fremont CA (US)
Dharma Ratnam Srichurnam of Hyderabad (IN)
SHARED RPS CLEAN AND BYPASS DELIVERY ARCHITECTURE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240047185 titled 'SHARED RPS CLEAN AND BYPASS DELIVERY ARCHITECTURE
Simplified Explanation
The patent application describes substrate processing systems that include a lid plate, a gas feed line with an RPS outlet and a bypass outlet, and a remote plasma unit supported on the lid plate. The remote plasma unit has an inlet and an outlet, with the inlet coupled to the RPS outlet. The systems also have a center manifold with an RPS inlet coupled to the outlet and a bypass inlet coupled to the bypass outlet. The center manifold has multiple outlet ports. Additionally, there are multiple side manifolds fluidly coupled to the outlet ports, with each side manifold defining a gas lumen. The systems also include multiple output manifolds seated on the lid plate, with each output manifold fluidly coupled to the gas lumen of one of the side manifolds.
- The patent application describes substrate processing systems with a lid plate, gas feed line, remote plasma unit, center manifold, side manifolds, and output manifolds.
- The lid plate supports the remote plasma unit, which has an inlet and outlet.
- The gas feed line has an RPS outlet and a bypass outlet.
- The inlet of the remote plasma unit is connected to the RPS outlet of the gas feed line.
- The center manifold has an RPS inlet connected to the outlet of the remote plasma unit and a bypass inlet connected to the bypass outlet of the gas feed line.
- The center manifold has multiple outlet ports.
- The outlet ports of the center manifold are fluidly coupled to multiple side manifolds.
- Each side manifold defines a gas lumen.
- The output manifolds are seated on the lid plate and are fluidly coupled to the gas lumen of one of the side manifolds.
Potential Applications:
- Substrate processing systems for various industries such as semiconductor manufacturing, solar panel production, and display manufacturing.
- Can be used in plasma etching, deposition, and cleaning processes.
Problems Solved:
- Provides a more efficient and controlled gas distribution system for substrate processing.
- Allows for precise control of gas flow and plasma generation.
- Reduces the risk of contamination and improves process uniformity.
Benefits:
- Improved substrate processing performance and yield.
- Enhanced process control and flexibility.
- Reduced maintenance and downtime.
- Cost-effective and scalable solution for large-scale production.
Original Abstract Submitted
exemplary substrate processing systems may include a lid plate. the systems may include a gas feed line having an rps outlet and a bypass outlet. the systems may include a remote plasma unit supported atop the lid plate. the remote plasma unit may include an inlet and an outlet. the inlet may be coupled with the rps outlet. the systems may include a center manifold having an rps inlet coupled with the outlet and a bypass inlet coupled with the bypass outlet. the center manifold may include a plurality of outlet ports. the systems may include a plurality of side manifolds that are fluidly coupled with the outlet ports. each of the side manifolds may define a gas lumen. the systems may include a plurality of output manifolds seated on the lid plate. each output manifold may be fluidly coupled with the gas lumen of one of the side manifolds.
