20240047232. HIGH CONDUCTANCE DIVERT LINE ARCHITECTURE simplified abstract (Applied Materials, Inc.)

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HIGH CONDUCTANCE DIVERT LINE ARCHITECTURE

Organization Name

Applied Materials, Inc.

Inventor(s)

Abhijit A. Kangude of San Jose CA (US)

Elizabeth Neville of Sunnyvale CA (US)

Arun Chakravarthy Chakravarthy of Panruit (IN)

HIGH CONDUCTANCE DIVERT LINE ARCHITECTURE - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240047232 titled 'HIGH CONDUCTANCE DIVERT LINE ARCHITECTURE

Simplified Explanation

The abstract describes an exemplary semiconductor processing system that includes a lid plate and a gas splitter. The gas splitter is seated on the lid plate and has a top surface and multiple side surfaces. It defines a gas inlet, a gas outlet, a gas lumen that connects the gas inlet and the gas outlet, and a first divert lumen that directs gases away from a processing chamber through a divert outlet. The system also includes a first divert weldment that extends from and fluidly couples to the divert outlet, and it has a first divert weldment outlet and a second divert weldment outlet.

  • The semiconductor processing system includes a lid plate and a gas splitter.
  • The gas splitter is seated on the lid plate and has a top surface and multiple side surfaces.
  • The gas splitter defines a gas inlet, a gas outlet, a gas lumen, and a first divert lumen.
  • The gas lumen connects the gas inlet and the gas outlet, while the first divert lumen directs gases away from the processing chamber through a divert outlet.
  • The system also includes a first divert weldment that extends from the divert outlet and has a first divert weldment outlet and a second divert weldment outlet.

Potential Applications:

  • This technology can be used in semiconductor processing systems to control the flow of gases during the manufacturing process.
  • It can be applied in various stages of semiconductor fabrication, such as deposition, etching, and cleaning processes.

Problems Solved:

  • The gas splitter and divert weldment help to direct gases away from the processing chamber, preventing contamination and maintaining a clean environment.
  • The system ensures efficient gas flow and distribution, improving the overall performance and quality of semiconductor processing.

Benefits:

  • Improved gas flow control and distribution enhance the efficiency and effectiveness of semiconductor processing.
  • The technology helps to maintain a clean processing environment, reducing the risk of contamination and improving yield.
  • It enables precise control over gas flow, allowing for more accurate and consistent semiconductor fabrication.


Original Abstract Submitted

exemplary semiconductor processing systems may include a lid plate and a gas splitter. the gas splitter may be seated on the lid plate. the gas splitter may include a top surface and a plurality of side surfaces. the gas splitter may define a gas inlet, a gas outlet, a gas lumen that extends between and fluidly couples the gas inlet with the gas outlet, and a first divert lumen that is fluidly coupled with the gas lumen and that directs gases away from a processing chamber through a divert outlet. the semiconductor processing system may include a first divert weldment. the first divert weldment may extend from and fluidly couple to the divert outlet. the first divert weldment may include a first divert weldment outlet and a second divert weldment outlet.

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